. . . . "90-386-2231-7" . "\u0160m\u00EDd, Radek" . . "Actinometry for understanding PECVD of thin films from O2/HMDSO plasmas"@en . "2005-07-17+02:00"^^ . "[31BD05919286]" . "P(1K05025), Z(MSM 143100003), Z(MSM0021622411)" . . "Zaj\u00ED\u010Dkov\u00E1, Lenka" . "RIV/00216224:14310/05:00014212!RIV10-MSM-14310___" . . . "14310" . . . . "3"^^ . . . . . "actinometry; HMDSO; optical emission spectroscopy"@en . "4"^^ . "We applied actinometry for the calculation of dissociation degree in oxygen CCP discharges used for the deposition from O2/HMDSO plasmas. Dissociation degree exhibited a slight increase with increasing r.f. power and maximum of 20% for 5 Pa of oxygen. This relatively high value was not enough for deposition of SiO2-like films because the HMDSO percentage in the feed was too high at this low oxygen partial pressure. Rapid decrease of dissociation degree to 2-4% for higher oxygen flow rates, i.e. higher pressures resulted in still insufficient oxidation of film precursors."@en . "3"^^ . "RIV/00216224:14310/05:00014212" . "Bur\u0161\u00EDkov\u00E1, Vilma" . . "Eindhoven, Nizozem\u00ED" . "We applied actinometry for the calculation of dissociation degree in oxygen CCP discharges used for the deposition from O2/HMDSO plasmas. Dissociation degree exhibited a slight increase with increasing r.f. power and maximum of 20% for 5 Pa of oxygen. This relatively high value was not enough for deposition of SiO2-like films because the HMDSO percentage in the feed was too high at this low oxygen partial pressure. Rapid decrease of dissociation degree to 2-4% for higher oxygen flow rates, i.e. higher pressures resulted in still insufficient oxidation of film precursors." . "Eindhoven, Nizozem\u00ED" . . . "Eindhoven University of Technology, Nizozem\u00ED" . "511289" . "Actinometry for understanding PECVD of thin films from O2/HMDSO plasmas" . "Proceedings of the XXVII ICPIG" . . "Actinometry for understanding PECVD of thin films from O2/HMDSO plasmas" . . "Actinometry for understanding PECVD of thin films from O2/HMDSO plasmas"@en . .