. "0-8194-5757-4" . "534709" . "\u010Cudek, Vladim\u00EDr" . . . . . "14310" . "DLC films; mechanical stress; two-beam interferometry; chromatic aberration method"@en . "Klapetek, Petr" . "Optical measurement of mechanical stresses in diamond-like carbon films" . . "Ohl\u00EDdal, Ivan" . . . . . . "2005-01-01+01:00"^^ . "[9C9B87619717]" . "February 14-18, 2005, Merida, Yucatan, Mexico" . . . . "Optical measurement of mechanical stresses in diamond-like carbon films" . "Optical measurement of mechanical stresses in diamond-like carbon films"@en . . . "RIV/00216224:14310/05:00013025!RIV10-MSM-14310___" . . "Bur\u0161\u00EDkov\u00E1, Vilma" . "6"^^ . "P(GA101/04/2131), Z(MSM 143100003)" . "8-th International Symposium on Laser Metrology" . . "5"^^ . "RIV/00216224:14310/05:00013025" . . "In this paper the mechanical stresses taking place in diamond like thin films prepared by the plasma enhanced chemical vapor deposition onto silicon single crystal substrates are studied. For determination of the stress values the Stoney's formula is used. The values of the film thicknesses are determined using the combined method of variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. The values of the curvature radii of the deformed silicon substrates in consequence of the film stresses are evaluated using interferometric method based on two-beam interferometry and chromatic aberration method. The dependence of the mechanical stress inside these films on their thickness values is determined. It is found that this dependence can be approximate by the straight-line. The results achieved for the mechanical stresses obtained by both the optical methods, i.e. by the interferometric and chromatic aberration method, are compared."@en . "Franta, Daniel" . "In this paper the mechanical stresses taking place in diamond like thin films prepared by the plasma enhanced chemical vapor deposition onto silicon single crystal substrates are studied. For determination of the stress values the Stoney's formula is used. The values of the film thicknesses are determined using the combined method of variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. The values of the curvature radii of the deformed silicon substrates in consequence of the film stresses are evaluated using interferometric method based on two-beam interferometry and chromatic aberration method. The dependence of the mechanical stress inside these films on their thickness values is determined. It is found that this dependence can be approximate by the straight-line. The results achieved for the mechanical stresses obtained by both the optical methods, i.e. by the interferometric and chromatic aberration method, are compared." . "12"^^ . "Ohl\u00EDdal, Miloslav" . . "SPIE - The International Society for Optical Engineering" . . "Optical measurement of mechanical stresses in diamond-like carbon films"@en . . "Bellingham, Washington, USA" . .