"Tvrd\u00E9 diamantu podobn\u00E9 uhl\u00EDkov\u00E9 vrstvy (DLC) s p\u0159\u00EDm\u011Bs\u00ED SiOx bylu p\u0159ipraveny v kapacitn\u011B v\u00E1zan\u00E9m vf v\u00FDboji ze sm\u011Bsi metanu a hexametyldisiloxanu (HMDSO). Byl m\u011Bn\u011Bn pr\u016Ftok HMDSO, co\u017E ovliv\u0148ovalo mno\u017Estv\u00ED SiOx ve vrstv\u00E1ch. Metodou Rutherfordovsk\u00E9ho zp\u011Btn\u00E9ho rozptylu kombinovanou s metodou ERDA bylo stanoveno kompletn\u00ED atom\u00E1rn\u00ED slo\u017Een\u00ED vrstev. Tlou\u0161\u0165ka a optick\u00E9 vlastnosti byly stanoveny z elipsometrick\u00FDch m\u011B\u0159en\u00ED. Mechanick\u00E9 vlastnosti byly studov\u00E1ny hloubkov\u011B citlivou indenta\u010Dn\u00ED technikou za pomoc\u00ED p\u0159\u00EDstroje Fischerscope H100. Pom\u011Br O/Si v DLC:SiOx vrstv\u00E1ch byl 0,286 a obsah SiOx se zvy\u0161oval s rostouc\u00EDm pom\u011Brem pr\u016Ftoku HMDSO k metanu (q). Vrstvy DLC:SiOx byly z hlediska optick\u00FDch vlastnost\u00ED v uv a viditeln\u00E9 oblasti podobn\u00E9 vrstv\u00E1m DLC a vykazovaly podobn\u011B vysokou tvrdost jako DLC vrstvy pokud byl pom\u011Br q maxim\u00E1ln\u011B 0,25. Poda\u0159ilo se ov\u0161em zredukovat vysok\u00E9 tlakov\u00E9 pnut\u00ED ve vrstv\u00E1ch, byla podstatn\u011B vylep\u0161ena lomov\u00E1 hou\u017Eevnatost a zv\u00FD\u0161ila se depozi\u010Dn\u00ED rychlost."@cs . "RIV/00216224:14310/03:00021418!RIV08-MSM-14310___" . "Vztah mezi obsahem SiOx a vlastnostmi vrstev DLC:SiOx p\u0159ipraven\u00FDmi PECVD"@cs . . . "Correlation between SiOx Content and Properties of DLC:SiOx Films Prepared by PECVD"@en . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . "174-175" . "Hard diamond like carbon (DLC) films with an addition of SiOx were deposited in capacitively coupled rf discharges from a mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate of HMDSO was changed in order to vary the SiOx content in the films. Complete atomic composition of the films was determined by Rutherford backscattering spectroscopy combined with elastic recoil detection analysis. The thickness and the optical properties were obtained from the ellipsometric measurements. The mechanical properties were studied by a depth sensing indentation technique using Fischerscope H100 tester. The O/Si ratio in DLC:SiOx films was 0.286 and the content of SiOx increased with the HMDSO-to-methane flow rate ratio q. The DLC:SiOx films were close to DLC films as concerning the optical properties in the uv/visible and the high hardness if q was maximum 0.25. However, the compressive stress in the films was reduced, the film fracture toughness was improved and the deposition rate increased." . "RIV/00216224:14310/03:00021418" . . "14310" . . "0257-8972" . "4"^^ . "Hard diamond like carbon (DLC) films with an addition of SiOx were deposited in capacitively coupled rf discharges from a mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate of HMDSO was changed in order to vary the SiOx content in the films. Complete atomic composition of the films was determined by Rutherford backscattering spectroscopy combined with elastic recoil detection analysis. The thickness and the optical properties were obtained from the ellipsometric measurements. The mechanical properties were studied by a depth sensing indentation technique using Fischerscope H100 tester. The O/Si ratio in DLC:SiOx films was 0.286 and the content of SiOx increased with the HMDSO-to-methane flow rate ratio q. The DLC:SiOx films were close to DLC films as concerning the optical properties in the uv/visible and the high hardness if q was maximum 0.25. However, the compressive stress in the films was reduced, the film fracture toughness was improved and the deposition rate increased."@en . "Zaj\u00ED\u010Dkov\u00E1, Lenka" . "281-285" . "Jan\u010Da, Jan" . "Correlation between SiOx Content and Properties of DLC:SiOx Films Prepared by PECVD" . . "Vztah mezi obsahem SiOx a vlastnostmi vrstev DLC:SiOx p\u0159ipraven\u00FDmi PECVD"@cs . "[3D08FC9CD965]" . "Mackov\u00E1, Anna" . "5"^^ . . "Bur\u0161\u00EDkov\u00E1, Vilma" . "Correlation between SiOx Content and Properties of DLC:SiOx Films Prepared by PECVD"@en . . . "2003" . . "Pe\u0159ina, Vratislav" . "P(KSK1010104), Z(MSM 143100003)" . . . "5"^^ . . "Surface and Coating Technology" . . "602291" . . . . . . "Correlation between SiOx Content and Properties of DLC:SiOx Films Prepared by PECVD" . . "DLC; PECVD"@en .