. "2001-01-01+01:00"^^ . . . "RIV/00216224:14310/01:00003099!RIV08-MSM-14310___" . . . "43" . "Jan\u010Da, Jan" . . "Bratislava (Slovakia)" . "Deposition of DLC:Si(O) Films in Low Pressure Discharges" . "Univerzita Komensk\u00E9ho v Bratislave. Katedra fyziky plazmy & Fyzik\u00E1lny \u00FAstav" . . "Study of the properties of silicon doped DLC films deposited in rf low pressure discharges. Investigation of the influence of the deposition parameters on the film properties." . "Deposition of DLC:Si(O) Films in Low Pressure Discharges"@en . . "P(GA202/00/P037), P(ME 301), P(ME 367), P(OC 527.20), Z(MSM 143100003)" . "15.-21. 1. 2001, Tale, Low Tatras (Slovakia)" . . "Deposition of DLC:Si(O) Films in Low Pressure Discharges"@en . "677150" . "DLC; Plasma Enhanced CVD; RF Discharges"@en . "Study of the properties of silicon doped DLC films deposited in rf low pressure discharges. Investigation of the influence of the deposition parameters on the film properties."@en . "[0F0F011B17CC]" . "Deposition of DLC:Si(O) Films in Low Pressure Discharges"@cs . "Proceedings of 13th Symposium on Application of Plasma Processes" . . . "Bur\u0161\u00EDkov\u00E1, Vilma" . . "14310" . . "Mackov\u00E1, Anna" . "RIV/00216224:14310/01:00003099" . . "Deposition of DLC:Si(O) Films in Low Pressure Discharges"@cs . "Study of the properties of silicon doped DLC films deposited in rf low pressure discharges. Investigation of the influence of the deposition parameters on the film properties."@cs . . . "Deposition of DLC:Si(O) Films in Low Pressure Discharges" . "Pe\u0159ina, Vratislav" . . "5"^^ . "80-223-1573-7" . . . "5"^^ . . "Zaj\u00ED\u010Dkov\u00E1, Lenka" . . "4"^^ . . . . .