"XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina" . . "http://dx.doi.org/10.1016/j.apsusc.2011.09.025" . . . "[AD49EA0F99B1]" . "P(GD202/09/H041), S, Z(MSM0021620834)" . . . "6"^^ . . . "Nehasil, V\u00E1clav" . . . "3"^^ . . . . "258" . "Alumina-supported mixed bimetallic Rh-V thin films, with the overall thickness of 0.8 ML, were prepared under the ultrahigh vacuum (UHV) conditions and characterized with respect to their electronic and CO adsorption properties. X-ray photoelectron spectroscopy (XPS) was utilized to characterize electronic changes accompanying bimetallic Rh-V interaction and interaction between metal and polycrystalline gamma-Al(2)O(3) substrate. The chemisorption properties were probed by temperature-programmed desorption spectroscopy (TPD) of CO molecules. The electronic and chemisorption properties of the mixed layers were compared with pure Rh and V layers grown on the same gamma-Al(2)O(3) substrate and with a model bimetallic Rh-V system prepared by V deposition on a polycrystalline Rh foil. By varying the preparation conditions, we observed a strong dependence of the studied properties on the position of the V atoms. The presence of V atoms on the surface led to a fast deactivation, while vanadium presented under the surface resulted in a weakening of CO-metal surface bond, a change in the proportion of the adsorption side species, and an increase of CO dissociation. (C) 2011 Elsevier B. V. All rights reserved."@en . "10.1016/j.apsusc.2011.09.025" . "3"^^ . . . "Alumina-supported mixed bimetallic Rh-V thin films, with the overall thickness of 0.8 ML, were prepared under the ultrahigh vacuum (UHV) conditions and characterized with respect to their electronic and CO adsorption properties. X-ray photoelectron spectroscopy (XPS) was utilized to characterize electronic changes accompanying bimetallic Rh-V interaction and interaction between metal and polycrystalline gamma-Al(2)O(3) substrate. The chemisorption properties were probed by temperature-programmed desorption spectroscopy (TPD) of CO molecules. The electronic and chemisorption properties of the mixed layers were compared with pure Rh and V layers grown on the same gamma-Al(2)O(3) substrate and with a model bimetallic Rh-V system prepared by V deposition on a polycrystalline Rh foil. By varying the preparation conditions, we observed a strong dependence of the studied properties on the position of the V atoms. The presence of V atoms on the surface led to a fast deactivation, while vanadium presented under the surface resulted in a weakening of CO-metal surface bond, a change in the proportion of the adsorption side species, and an increase of CO dissociation. (C) 2011 Elsevier B. V. All rights reserved." . . "XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina"@en . . "Matol\u00EDn, Vladim\u00EDr" . "NL - Nizozemsko" . "2" . . "RIV/00216208:11320/11:10108201!RIV12-GA0-11320___" . . "XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina" . . . . "Applied Surface Science" . "XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina"@en . . . "0169-4332" . "P\u00ED\u0161, Igor" . "RIV/00216208:11320/11:10108201" . "Carbon monoxide; Vanadium; Rhodium; Temperature programmed desorption; X-ray photoelectron spectroscopy; Model catalyst"@en . "000296525800042" . . "11320" . "241975" .