. "Kim, Taeyoung" . "4"^^ . "Surface and Interface Analysis" . . . "Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study" . . "Tsud, Nataliya" . . . . "RIV/00216208:11320/10:10071368" . "Matol\u00EDn, Vladim\u00EDr" . "Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study"@en . "2"^^ . "42" . . "0142-2421" . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . "An epitaxial ultra-thin alumina layer was prepared on Ni(111) by simultaneous Al deposition and oxidation at elevated temperatures. Different deposition procedures lead to creation of oxide layers of various thicknesses and quality. Low-energy electron diffraction revealed epitaxial parameters of the films and the relationship between the nickel substrate and the oxide overlayer. Core-level photoelectron spectroscopy using Al-K-alpha and synchrotron-generated photons show that the oxide-metal interface is formed by oxygen atoms, which is contrary to the case of epitaxial alumina layers prepared by the oxidation of NiAl(110) and Ni3Al(111) surfaces. The results of a photoelectric work function measurement are also discussed." . . "261070" . "Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study"@en . "Z(MSM0021620834)" . "Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study" . "thin layer; aluminum oxide; alumina; Ni; LEED; XPS"@en . . . "11320" . "An epitaxial ultra-thin alumina layer was prepared on Ni(111) by simultaneous Al deposition and oxidation at elevated temperatures. Different deposition procedures lead to creation of oxide layers of various thicknesses and quality. Low-energy electron diffraction revealed epitaxial parameters of the films and the relationship between the nickel substrate and the oxide overlayer. Core-level photoelectron spectroscopy using Al-K-alpha and synchrotron-generated photons show that the oxide-metal interface is formed by oxygen atoms, which is contrary to the case of epitaxial alumina layers prepared by the oxidation of NiAl(110) and Ni3Al(111) surfaces. The results of a photoelectric work function measurement are also discussed."@en . . "[06AD90BC003E]" . . "Yoshitake, Michiko" . "10-11" . "Nem\u0161\u00E1k, Slavom\u00EDr" . . . "Sk\u00E1la, Tom\u00E1\u0161" . "Yagyu, Shinjiro" . . . . . "000282668800016" . "RIV/00216208:11320/10:10071368!RIV11-MSM-11320___" . "7"^^ .