"NL - Nizozemsko" . . "Influence;concentration;acetylene;production;CH4/N2;afterglow;numerical;simulation"@en . . "2-4" . . "11320" . . "Hrach, Rudolf" . . "Vacuum" . . . . . . "4"^^ . "0"^^ . . "0"^^ . . . "Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation"@en . "RIV/00216208:11320/01:00105848!RIV/2002/GA0/113202/N" . "403;407" . "2"^^ . . . "Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation" . "[7D29F312AB30]" . "0042-207X" . "Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation"@en . . . "P(GA202/98/P246), P(OK 409), Z(MSM 113200002)" . . . . "61" . "Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation" . "Hrachov\u00E1, V\u011Bra" . "5"^^ . . "Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation"@en . . "Influence of C atom concentration for acetylene production in a CH4/N2 afterglow: a numerical simulation" . "RIV/00216208:11320/01:00105848" . "682753" . . .