"Development of new methods of design of thin film systems produced in the optics industry including film defects and original methods of characterization of these systems that will allow improving their quality. Technological changes of deposition of multilayer systems such as mirrors with high reflectance, anti-reflective coatings, beam splitters and polarizers, minimizing their imperfections namely in the ultraviolet part of the spectrum and enabling new progressive applications."@en . . . . " Al2O3" . "characterization of single SiO2, HfO2, Al2O3, TiO2, MgF2 layers- including thin film defects in characterization- design of thin film systems- vacuum evaporation from thermal and electron sources- cathodic sputtering"@en . "0"^^ . "2015-05-05+02:00"^^ . . . "1"^^ . "3"^^ . "2015-12-31+01:00"^^ . . "2014-03-07+01:00"^^ . . " HfO2" . . . "Optimalizace vrstevnat\u00FDch syst\u00E9m\u016F pou\u017E\u00EDvan\u00FDch v optick\u00E9m pr\u016Fmyslu" . " TiO2" . "17"^^ . "17"^^ . "characterization of single SiO2" . "Vyvinut\u00ED nov\u00FDch metod n\u00E1vrhu syst\u00E9m\u016F tenk\u00FDch vrstev vyr\u00E1b\u011Bn\u00FDch v optick\u00E9m pr\u016Fmyslu zahrnuj\u00EDc\u00EDch defekty vrstev a origin\u00E1ln\u00EDch metod charakterizace t\u011Bchto syst\u00E9m\u016F umo\u017E\u0148uj\u00EDc\u00EDch zdokonalen\u00ED kontroly kvality. Technologick\u00E9 zm\u011Bny depozice vrstevnat\u00FDch syst\u00E9m\u016F vyr\u00E1b\u011Bn\u00FDch v optick\u00E9m pr\u016Fmyslu, jako jsou zrcadla s vysokou odrazivost\u00ED, antireflexn\u00ED pokryt\u00ED, d\u011Bli\u010De sv\u011Btla a polariz\u00E1tory, minimalizuj\u00EDc\u00ED jejich nedokonalosti p\u0159edev\u0161\u00EDm v ultrafialov\u00E9 oblasti spektra a umo\u017E\u0148uj\u00EDc\u00ED nov\u00E9 progresivn\u00ED aplikace." . "2012-01-01+01:00"^^ . "TA02010784" . . . "http://www.isvav.cz/projectDetail.do?rowId=TA02010784"^^ . . . . . . "Optimization of thin film systems used in the optics industry"@en . . . .