"0"^^ . . " environmental" . . "2014-12-31+01:00"^^ . . . "1"^^ . "1"^^ . " plasma assisted chemical vapor deposition" . " reliability" . . "N\u00EDzkoteplotn\u00ED hybridn\u00ED mikrovlnn\u00E9 plazmov\u00E9 zdroje s vysok\u00FDm stupn\u011Bm ionizace uspo\u0159\u00E1dan\u00FDch v matricov\u00E9 konfiguraci umo\u017E\u0148uj\u00EDc\u00EDch depozice perspektivn\u00FDch materi\u00E1l\u016F a jejich (nano) kompozit\u016F na 2D a 3D objekty" . " thin films" . . . "TA01011740" . "2015-05-05+02:00"^^ . "Hybrid high-density low-temperature microwave plasma sources in matrix configuration suitable for growth of advanced materials and their (nano) composites on 2D and 3D substrates"@en . . " advanced materials" . "Main goal of the proposed project is design, development and realization of hybrid and fully modular microwave plasma assisted chemical vapor deposition system based on high-density cold-plasma generated by surfatron suitable for growth of novel and advanced materials and their (nano) composite forms such as oxides (TiO2, ZnO) or diamond. The main challenging part of the project is fulfilling several industrial aspects in one platform where requirements like implementation of 2D/3D geometrically shaped substrates, large area, low temperature growth, high reliability and reproducibility of whole plasma deposition process and long-term well defined process conditions will be combined. For this purpose, such plasma system either in radial or linear arrangement will be systematically studied by variety of analytic conditions as the function of process parameters (total pressure, gas mixture, plasma source geometry, etc.). The final deposition system will be the backbone for further industrial uses."@en . "2013-02-28+01:00"^^ . . . "http://www.isvav.cz/projectDetail.do?rowId=TA01011740"^^ . "cold plasma" . . "2011-01-01+01:00"^^ . . " hybrid and modular system" . "cold plasma; plasma assisted chemical vapor deposition; thin films; nanotechnology; advanced materials; hybrid and modular system; environmental; reliability; reproducibility"@en . . . . . "Hlavn\u00EDm c\u00EDlem p\u0159edkl\u00E1dan\u00E9ho projektu je n\u00E1vrh, v\u00FDvoj a realizace hybridn\u00EDho a pln\u011B modul\u00E1rn\u00EDho mikrovlnn\u00E9ho syst\u00E9mu chemick\u00E9 depozice z plynn\u00E9 f\u00E1ze za asistence plazmatu zalo\u017Een\u00E9ho na n\u00EDzkoteplotn\u00EDm zdroji plazmatu, surfatronu, s vysok\u00FDm stupn\u011Bm ionizace, kter\u00FD bude vhodn\u00FD pro r\u016Fst nov\u00FDch, modern\u00EDch materi\u00E1l\u016F a jejich (nano) kompozitn\u00EDch forem, jako jsou nap\u0159\u00EDklad oxidy (TiO2, ZnO) nebo diamant. Hlavn\u00ED v\u00FDzvou projektu je zaji\u0161t\u011Bn\u00ED n\u011Bkolika r\u016Fzn\u00FDch pr\u016Fmyslov\u00FDch aspekt\u016F v jednom syst\u00E9mu. Jedn\u00E1 se nap\u0159\u00EDklad o kombinace depozice na rozs\u00E1hl\u00E9 plochy \u010Di 2D/3D objekty, n\u00EDzk\u00E9 depozi\u010Dn\u00ED teploty, vysok\u00E9 spolehlivosti a reprodukovatelnosti plazmov\u00E9 depozice p\u0159i zachov\u00E1n\u00ED dlouhodob\u00E9 stability cel\u00E9ho procesu. Zdroj plazmatu v radi\u00E1ln\u00EDm \u010Di line\u00E1rn\u00EDm uspo\u0159\u00E1d\u00E1n\u00ED bude systematicky studov\u00E1n mno\u017Estv\u00EDm analytick\u00FDch metod v z\u00E1vislosti na procesn\u00EDch parametrech (celkov\u00FD tlak, slo\u017Een\u00ED plynn\u00E9 sm\u011Bsi, geometrie syst\u00E9mu zdroje plazmatu a podobn\u011B). V\u00FDsledn\u00FD depozi\u010Dn\u00ED syst\u00E9m bude vhodn\u00FD pro \u0161irok\u00E9 spektrum pr\u016Fmyslov\u00FDch aplikac\u00ED." . " nanotechnology" . "19"^^ . . . "19"^^ . .