" magnetron sputtering" . "2012-12-31+01:00"^^ . "2010-05-01+02:00"^^ . . "http://www.isvav.cz/projectDetail.do?rowId=OC10045"^^ . "2012-02-27+01:00"^^ . . "2013-06-28+02:00"^^ . "Novel plasma sources" . . "OC10045" . . . . "C\u00EDlem projektu je objasn\u011Bn\u00ED fyzik\u00E1ln\u00ED podstaty \u010Dinnosti t\u0159\u00ED nov\u00FDch magnetronov\u00FDch syst\u00E9m\u016F pro rychlou depozici vrstev a pulzn\u00ED magnetronov\u00E9 depozice vrstev na b\u00E1zi uhl\u00EDku a nov\u00FDch vrstev Si-B-C-N s mimo\u0159\u00E1dn\u011B vysokou teplotn\u00ED stabilitou." . "13"^^ . "Novel plasma sources for film deposition and surface modification"@en . . . "13"^^ . "Non-stationary model was used for explanation of high-power impulse magnetron sputtering. Two pulsed magnetron systems were used to prepare non-conductive oxides and Ta-O-N oxynitrides, high-temperature Si-B-C-N materials and nanostructured Zr-B-C-N films. The results were published in 5 papers in international journals and presented in 12 contributions at international conferences."@en . "The project is aimed at plasma technologies with a high application potential. Research will be mainly focused on fundamental aspects of magnetron operation in three novel high-power pulsed systems. They will be used for high-rate deposition of carbon-based films, various oxide and nitride films and for deposition of high-temperature Si-B-C-N films."@en . . . "0"^^ . . . . " high-power pulsed systems" . "1"^^ . . . . " film deposition and surface modification" . "Nov\u00E9 plazmov\u00E9 zdroje pro depozici vrstev a modifikaci povrch\u016F" . . " oxides and nitrides" . "0"^^ . "Nestacion\u00E1rn\u00ED model byl pou\u017Eit k objasn\u011Bn\u00ED procesu vysokov\u00FDkonov\u00E9 pulzn\u00ED magnetronov\u00E9 depozice. Dva pulzn\u00ED magnetronov\u00E9 syst\u00E9my byly vyu\u017Eity k p\u0159\u00EDprav\u011B nevodiv\u00FDch oxid\u016F a oxynitrid\u016F Ta-O-N, vysokoteplotn\u00EDch materi\u00E1l\u016F Si-B-C-N a nanostrukturn\u00EDch vrstev Zr-B-C-N. V\u00FDsledky byly publikov\u00E1ny v 5 \u010Dl\u00E1nc\u00EDch v mezin\u00E1rodn\u00EDch \u010Dasopisech a prezentov\u00E1ny ve 12 p\u0159\u00EDsp\u011Bvc\u00EDch na mezin\u00E1rodn\u00EDch konferenc\u00EDch."@cs . . "Novel plasma sources; film deposition and surface modification; magnetron sputtering; high-power pulsed systems; carbon-based films; oxides and nitrides; high-temperature Si-B-C-N materials."@en . . . " carbon-based films" .