"24"^^ . "24"^^ . "Plasma systems; thin films; protective layers; new materials; high-rate deposition; pulse techniques; magnetron sputtering; microwave plasmas; carbon-based films; silicon-based films."@en . "P\u0159edm\u011Btem navr\u017Een\u00E9ho projektu je v\u00FDzkum nov\u00FDch syst\u00E9m\u016F pro p\u0159\u00EDpravu tenk\u00FDch vrstev v plazmatu s c\u00EDlem vytvo\u0159it nov\u00E9 materi\u00E1ly unik\u00E1tn\u00EDch vlastnost\u00ED a vyvinout novou technologii pro velmi rychl\u00E9 nan\u00E1\u0161en\u00ED vrstev jako mo\u017Enou n\u00E1hradu galvanick\u00FDch proces\u016F s negativn\u00EDm vlivem na \u017Eivotn\u00ED prost\u0159ed\u00ED. Projekt bude zam\u011B\u0159en na n\u00E1sleduj\u00EDc\u00ED problematiku: 1. Pulzn\u00ED magnetronov\u00E9 napracov\u00E1n\u00ED vrstev. 2. Tenk\u00E9 vrstvy na b\u00E1zi uhl\u00EDku a k\u0159em\u00EDku. 3. Ochrann\u00E9 povlaky vytv\u00E1\u0159en\u00E9 v mikrovlnn\u00E9m plazmatu." . . . "Rozvoj pozn\u00E1n\u00ED v oblasti pulzn\u00EDch magnetronov\u00FDch syst\u00E9m\u016F, reaktivn\u00ED magnetronov\u00E9 depozice vrstev na b\u00E1zi uhl\u00EDku a k\u0159em\u00EDku a plazmov\u00E9 nitridace oceli, hlin\u00EDku a hlin\u00EDkov\u00FDch slitin"@cs . " new materials" . . "0"^^ . . . "1"^^ . . "Nov\u00E9 syst\u00E9my pro p\u0159\u00EDpravu tenk\u00FDch vrstev v plazmatu" . . . "2009-05-22+02:00"^^ . " high-rate deposition" . " carbon-based films" . " pulse techniques" . "ME 203" . " thin films" . "0"^^ . . "http://www.isvav.cz/projectDetail.do?rowId=ME 203"^^ . "A solution of fundamental problems arising in research into new plasma systems for preparation of thin films with the aim to form new materials of unique properties and to develop new techniques for high-rate deposition of the films. The project is solvein a collaboration with the Institute of Vacuum Industrial Technology at the Sung Kyun Kwan University in Suwon (Korea). The main interest is focused on the following topics: (i) Pulse techniques of magnetron sputtering, (ii) Carbon- and silicon-based thin films, (iii) Protective layers produced in microwave plasmas."@en . " protective layers" . "New plasma systems for preparation of thin films"@en . . " magnetron sputtering" . . . "Plasma systems" . . . " microwave plasmas" . . .