. . . "About ten years ago a new plasma-chemical reactor with supersonic plasma channel (RPJ) has been developed in the Institute of Physics AS CR. In this reactor the plasma channel is reated by means of the RF unipolar hollow cathode discharge which is superimpose on the primary RF plasma. Experimentally has been found that by means of the RPJ reactor the thin films with defined stoichiometry have been achieved and the thin films can be deposit on the internal walls of cavities, holes and complex shapeof hollow substrates. Recently the two hollow cathode RPJ reactor has been developed by means of which is able to deposit the composite thin films and multilayer structures. Furthermore the RPJ reactor can be used for the novel application for example for surface treatment of polymers and materials which is possible utilize in the medicine, ecological programs and biophysics. Up to now the RPJ reactor has been utilize mostly on the base of the empirical knowledge."@en . "5"^^ . . "5"^^ . "IAA1010827" . . "http://www.isvav.cz/projectDetail.do?rowId=IAA1010827"^^ . . . "Byl vypracov\u00E1n model z\u00E1kladn\u00EDch proces\u016F pro n\u00EDzkotlak\u00FD RF doutnav\u00FD v\u00FDboj v unipol\u00E1rn\u00ED dut\u00E9 katod\u011B. V\u00FDsledky byly vyu\u017Eity pro optimalizaci parametr\u016F procesu depozice tenk\u00FDch vrstev."@cs . . . . . "0"^^ . . "Na konci osmdes\u00E1t\u00FDch let byl ve Fyzik\u00E1ln\u00EDm \u00FAstavu AV \u010CR vyvinut plazma-chemick\u00FD reaktor pracuj\u00EDc\u00ED na nov\u00E9m principu generace plazmov\u00E9ho kan\u00E1lu pomoc\u00ED indukovan\u00E9ho RF v\u00FDboje v dut\u00E9 katod\u011B, kter\u00FD se superponuje na RF v\u00FDboj a reaktoru. Experimenty uk\u00E1zaly, \u017Ee pomoc\u00ED tohoto reaktoru je mo\u017En\u00E9 nan\u00E1\u0161et tenk\u00E9 vrstvy s definovanou stechiometri\u00ED a nan\u00E1\u0161et tenk\u00E9 vrstvy do dutin a na substr\u00E1ty komplikovan\u00FDch tvar\u016F. V posledn\u00ED dob\u011B byl vyvinut dvoukatodov\u00FD syst\u00E9m, pomoc\u00ED kter\u00E9ho je mo\u017Eno nan\u00E1\u0161et kompositn\u00ED vrstvy a v\u00EDcevrstevnat\u00E9 struktury. Uveden\u00FD reaktor tak m\u016F\u017Ee nahradit n\u011Bkter\u00E9 dosavadn\u00ED technologie, kter\u00E9 maj\u00ED negativn\u00ED vliv na \u017Eivotn\u00ED prost\u0159ed\u00ED, a d\u00E1le umo\u017Enit zaveden\u00ED nov\u00FDch technologi\u00ED vyu\u017Eiteln\u00FDch nap\u0159. v medic\u00EDn\u011B, ekologii a v biofyzice. Ve v\u011Bt\u0161in\u011B p\u0159\u00EDpad\u016F se v\u0161ak dosud reaktory s dutou katodou vyu\u017E\u00EDvaly na z\u00E1klad\u011B p\u0159ev\u00E1\u017En\u011B empirick\u00FDch zku\u0161enost\u00ED bez komplexn\u00EDho studia proces\u016F v nich prob\u00EDhaj\u00EDc\u00EDch. C\u00EDlem p\u0159edlo\u017Een\u00E9ho projektu je proto prov\u00E9st komplexn\u00ED studium proces\u016F ve zm\u00EDn\u011Bn\u00E9m reaktoru." . "Processes in the unipolar RF hollow cathode discharge induced in the plasma reactor"@en . "Procesy v jednopolov\u00E9m RF v\u00FDboji s dutou katodou indukovan\u00E9m v plazmatick\u00E9m reaktoru" . . "0"^^ . . "1"^^ . .