. "2009-12-31+01:00"^^ . " electron resists" . " photoluminescence" . . "IAA100100622" . . "KONJUGOVAN\u00C9 K\u0158EM\u00CDKOV\u00C9 POLYMERY PRO REZISTY V NANOTECHNOLOGI\u00CDCH" . "Project solves the formation of metastable states in organosilicon polymers as weak and dangling bonds and their affecting by the choice of materials and active admixtures.The ways for the production of resists for the nano technologies have been devised"@en . . " dangling bonds" . . . "4"^^ . . "0"^^ . " photoelectron spectroscopy of polymers" . . . "2010-06-08+02:00"^^ . . "1"^^ . " cathodoluminescence" . . . "Projekt \u0159e\u0161\u00ED formov\u00E1n\u00ED metastabiln\u00EDch stav\u016F v organok\u0159em\u00EDkov\u00FDch polymerech, slab\u00FDch a p\u0159eru\u0161en\u00FDch vazeb a jejich ovlivn\u011Bn\u00ED v\u00FDb\u011Brem materi\u00E1l\u016F i aktivn\u00EDch p\u0159\u00EDsad. Byly navr\u017Eeny postupy k v\u00FDrob\u011B rezist\u016F z polysilan\u016F pro oblast nanotechnologi\u00ED."@cs . "Klasick\u00E1 optick\u00E1 a elektronov\u00E1 litografie z\u016Fst\u00E1vaj\u00ED hlavn\u00ED technologie v polovodi\u010Dov\u00E9m pr\u016Fmyslu ve v\u00FDrob\u011B i p\u0159i sou\u010Dasn\u00E9 \u0161\u00ED\u0159ce \u010D\u00E1ry 100 nm. Nov\u00E1 technologie nanotisku do polymer\u016F ji\u017E pracuje s rozli\u0161en\u00EDm 10 nm. Positivn\u00ED rezisty pro pokro\u010Dilou v\u00FDrobu masek s elektronov\u00FDmi vysokoenergetick\u00FDmi svazky tak mus\u00ED prod\u011Blat z\u00E1sadn\u00ED zm\u011Bny. Organick\u00E9 k\u0159em\u00EDkov\u00E9 nanostrukturn\u00ED polymern\u00ED materi\u00E1ly p\u0159edstavuj\u00ED novou skupinu elektronicky aktivn\u00EDch materi\u00E1l\u016F. C\u00EDlem projektu je v\u00FDzkum proces\u016F vedouc\u00EDch k formov\u00E1n\u00ED metastabiln\u00EDch stav\u016F v organick\u00FDch k\u0159em\u00EDkov\u00FDch polymerech jako jsou slab\u00E9 vazby, jejich konverze na p\u0159eru\u0161en\u00E9 vazby a ovlivn\u011Bn\u00ED t\u011Bchto proces\u016F jak v\u00FDb\u011Brem materi\u00E1l\u016F, tak i aktivn\u00EDch p\u0159\u00EDsad do aktivn\u00EDch k\u0159em\u00EDkov\u00FDch polymer\u016F. Metodiky, uplatn\u011Bn\u00E9 v projektu, budou fotoelektronov\u00E9 spektroskopie, ef\u00FAsn\u00ED spektroskopie a foto a katodoluminiscence, podporovan\u00E9 kvantov\u011B chemick\u00FDmi v\u00FDpo\u010Dty pro pochopen\u00ED mikrofyzik\u00E1ln\u00EDch jev\u016F vedouc\u00EDch k metastabilit\u011B a degradaci." . " effusion spectroscopy" . . "2006-01-01+01:00"^^ . "Classical optical and electron lithography continues to be the main technology used in the semiconductor industry for the fabrication at the current 100 nm design rules.Emerging nanoimprint lithography in polymers has already demonstrated 10nm resolution working principle. Positive tone resists for advanced mask-making with high-voltage electron-beams will thus have to undergo profound changes. Organic silicon nanostructural polymeric materials are a new group of electronically active materials. The aim of the project is the elucidation of processes leading to the formation of metastable states, as weak bonds, and their conversion to dangling bonds by both the choice of materials and active admixtures in organic silicon polymers. The methods applied in the project will be photoelectron spectroscopy, effusion spectroscopy, photo- and cathodoluminescence supported by quantum calculations for understanding of the microphysical phenomena responsible for metastability and degradation."@en . . " weak bonds" . "CONJUGATED SILICON \u2013 BASED POLYMER RESISTS FOR NANOTECHNOLOGIES"@en . "photodestructive changes - polymers, electron resists, nanostructural optoelectronics, dangling bonds, weak bonds, photoelectron spectroscopy of polymers, cathodoluminescence, photoluminescence, effusion spectroscopy,"@en . . . . "http://www.isvav.cz/projectDetail.do?rowId=IAA100100622"^^ . . "2009-04-28+02:00"^^ . . . " nanostructural optoelectronics" . "27"^^ . "photodestructive changes - polymers" . "27"^^ .