. " surfatron" . . . . "\u0158e\u0161en\u00ED projektu prob\u011Bhlo na vynikaj\u00EDc\u00ED \u00FArovni, a to jak z hlediska odborn\u00E9ho tak i z hlediska \u010Derp\u00E1n\u00ED finan\u010Dn\u00EDch prost\u0159edk\u016F."@cs . . . " tenk\u00E9 vrstvy" . " pulzn\u011B generovan\u00FD v\u00FDboj" . "magnetron" . "11"^^ . . "11"^^ . "magnetron; dut\u00E1 katoda; surfatron; plazmov\u00FD kan\u00E1l; pulzn\u011B generovan\u00FD v\u00FDboj; tenk\u00E9 vrstvy; technologie"@en . "C\u00EDlem projektu bude vyu\u017Eit\u00ED n\u011Bkolika diagnostick\u00FDch metod plazmatu (Langmuirova sonda, kalorimetrick\u00E1 sonda, energetick\u00FD analyz\u00E1tor iontu, laserova absorp\u010Dn\u00ED spektroskopie, optick\u00E1 emisn\u00ED spektroskopie) za \u00FA\u010Delem srovn\u00E1vac\u00EDho v\u00FDzkumu vlastnost\u00ED technologick\u00FDch plazmatick\u00FDch depozi\u010Dn\u00EDch syst\u00E9m\u016F." . "An investigation of low-temperature plasma in systems of a planar magnetron, in systems with hollow cathodes and a microwave surfatron"@en . "2011-04-16+02:00"^^ . "1"^^ . "V\u00FDzkum parametr\u016F n\u00EDzkoteplotn\u00EDho plazmatu v syst\u00E9mech plan\u00E1rn\u00EDho magnetronu, syst\u00E9m\u016F s dut\u00FDmi katodami a mikrovlnn\u00E9ho surfatronu" . . "The essence of suggested project is a\u00A0purposeful investigation of plasma parameters in the low-pressure technological plasma reactors\u00A0utilized for deposition of thin films. In the present time, there are several wholly different plasma sources - a planar magnetron, a plasma jet with hollow cathode, a microwave surfatron - dedicated for preparation of specific thin films and coatings, which are successfully used in the division of Optics of the Institute of Physics of the AS CR for deposition of thin films of perovskite oxides\u00A0(STO, BTO, BSTO, PZT), TiOx,\u00A0piezoelectric ZnO etc. on substrates made of various materials, e.g. polymers. A previous research showed that\u00A0properties of thin films\u00A0could be radically different if prepared by\u00A0means of above mentioned plasma deposition systems. Therefore, it is desirable to investigate in detail\u00A0attributes\u00A0of these\u00A0discharges and to carry out a basic comparative study of the plasma parameters, total energy flux density\u00A0on a substrate and the properties of deposited thin films among these plasma sources. Then\u00A0acquired knowledge should enable us partly to understand plasma properties of different plasma sources and to optimize the deposition process in the better\u00A0way for\u00A0concrete thin films by choosing of\u00A0 appropriate plasma source or their mutual combination."@en . "2015-03-02+01:00"^^ . . . "0"^^ . "2009-01-01+01:00"^^ . "0"^^ . . "The project was excellent, both in terms of expertise and in terms of disbursement of funds."@en . . . " plazmov\u00FD kan\u00E1l" . "2011-12-31+01:00"^^ . "http://www.isvav.cz/projectDetail.do?rowId=GP202/09/P159"^^ . . . . . " dut\u00E1 katoda" . . "GP202/09/P159" .