. . "The project was focused on finding techniques for nanostructures fabrication through templates and on the creation of a network of cooperative working groups of ASCR. The first step was mastering of nanoporous template fabrication as well as its creation"@en . . . "1"^^ . . "Neuvedeno."@en . "C\u00EDlem pr\u00E1ce bylo nal\u00E9zt techniky vytv\u00E1\u0159en\u00ED nanostruktur pomoc\u00ED masky a vytvo\u0159it s\u00ED\u0165 spolupracuj\u00EDc\u00EDch pracovi\u0161\u0165 AV\u010CR. V\u00A0prvn\u00EDm d\u00EDl\u010D\u00EDm kroku byla zvl\u00E1dnuta v\u00FDroba nanopor\u00E9zn\u00ED masky a jej\u00ED vytv\u00E1\u0159en\u00ED na tenk\u00E9 vrstv\u011B anodizac\u00ED. Anodizace byla nejd\u0159\u00EDve ov\u011B\u0159ena"@cs . . . . . . "Navrhovan\u00FD projekt umo\u017En\u00ED zaveden\u00ED nov\u00FDch technologi\u00ED ve st\u00E1vaj\u00EDc\u00ED laborato\u0159i tenk\u00FDch vrstev \u00DAstavu mikroelektroniky. P\u0159inese technologick\u00E9 spojen\u00ED v\u00EDce laborato\u0159\u00ED se zam\u011B\u0159en\u00EDm na techniky pro v\u00FDrobu mikro- a nanosyst\u00E9mu pro senzorovou techniku a pro v\u00FDrobu integrovan\u00FDch obvodu. Hlavn\u00EDm p\u0159\u00EDnosem bude tak\u00E9 zp\u0159\u00EDstupn\u011Bn\u00ED t\u00E9to technologie pro pot\u0159eby \u010Desk\u00FDch, ale i zahrani\u010Dn\u00EDch v\u011Bdeck\u00FDch pracovi\u0161\u0165. Budou vyvinuty techniky umo\u017E\u0148uj\u00EDc\u00ED realizaci syst\u00E9m\u016F MEMS za pomoc\u00ED zcela nov\u00FDch nanostrukturovan\u00FDch materi\u00E1l\u016F a zvl\u00E1\u0161tn\u00ED pozornost bude v\u011Bnov\u00E1na vyu\u017Eit\u00ED t\u011Bchto materi\u00E1l\u016F a postupu jejich v\u00FDroby p\u0159i realizaci masek integrovan\u00FDch obvodu s c\u00EDlem sn\u00ED\u017Eit tlou\u0161\u0165ku c\u00E1ry pod 100 nm. O\u010Dek\u00E1v\u00E1 se v\u00FDzkum a v\u00FDvoj technik depozice kovu za pou\u017Eit\u00ED nanostrukturn\u00ED masky, je\u017E umo\u017En\u00ED modifikaci povrchu (nap\u0159. elektrod), kde se p\u0159edpokl\u00E1d\u00E1 zlep\u0161en\u00ED parametru plan\u00E1rn\u00ED formy realizace, d\u00E1le pro vytv\u00E1\u0159en\u00ED nanokrystalu pro pot\u0159eby sol\u00E1rn\u00ED techniky, depozice oxidu pro senzory plynu nebo elektronick\u00E9 nosy apod." . . "2007-10-16+02:00"^^ . . "GP102/04/P162" . "0"^^ . . "The proposed project facilitates an establishment of new technologies in the current thin-film laboratory at the BUT Department of Microelectronics. It will bring technology association of laboratories focused on techniques for fabrication of micro- and nanomachining systems in sensors and in semiconductor industry. The main benefit will be also to make technology available for requirements of Czech and foreign scientist laboratories. Techniques facilitating a realization of MEMS will be developed usingnew nanostructured materials and special attention will be focused on an utilisation of this materials and processes of the fabrication for masks of integrated circuits to achieve line resolution below 100 nm. We expect to develop techniques of a metal deposition via nanostructured mask. It gives us a modification possibilities of metal surface (e.g. electrodes), where better parameters of the planar form are expected, and for fabrication of nanocrystals used in solar techniques, and deposition of"@en . "14"^^ . "Micro- and nanomachining structures fabricated by microelectronics technologies"@en . "14"^^ . "Mikro- a nanostruktury realizovan\u00E9 v mikroelektronick\u00FDch technologi\u00EDch" . . "http://www.isvav.cz/projectDetail.do?rowId=GP102/04/P162"^^ . . . . . . . "0"^^ .