. . "We propose in the project to perform investigation of plasma sources operating\u00A0in pulse regime (cylindrical and planar magnetron, hollow cathode and surfatron-generated plasma jet), to characterize plasma sources with respect to deposition of thin films and together with computer simulation to clarify physical processes during growth and formation of films. The plasma sources will be investigated by appropriate diagnostics methods and obtained results will be used as input parameters into the computer simulations. The main objectives are:- To optimize plasma sources in pulse regime for efficient thin oxide film deposition: low-pressure dc magnetron, hollow cathode and microwave plasma jet.- To implement in these plasma sources the best suitable forms of the time-resolved diagnostic techniques: electrostatic probe, optical emission and laser absorption spectroscopy, mass spectrometry and ion flux diagnostics.- To obtain experimental data on the complex plasma processes occurring within these sources and to understand their significance with respect to the deposited nanocrystalline material properties including diagnostics of crystallographic structure.- Acquired plasma parameters and measured thin film properties will be used for development of computer simulation of thin film growth and enable us to describe basic physical principles responsible for thin film formation."@en . "2013-06-12+02:00"^^ . "V projektu p\u0159edpokl\u00E1d\u00E1me prov\u00E9st v\u00FDzkum pulsn\u011B modulovan\u00FDch zdroj\u016F plazmatu (v\u00E1lcov\u00FD a plan\u00E1rn\u00ED magnetron, plazmov\u00E1 tryska,\u00A0mikrovlnn\u00FD surfatronov\u00FD\u00A0v\u00FDboj), jejich charakterizaci pro nan\u00E1\u0161en\u00ED tenk\u00FDch (p\u0159edev\u0161\u00EDm oxidov\u00FDch) vrstev a spolu s po\u010D\u00EDta\u010Dov\u00FDmi simulacemi objasnit fyzik\u00E1ln\u00ED procesy p\u0159i r\u016Fstu a formov\u00E1n\u00ED tenk\u00FDch vrstev. Plazma bude v\u00A0t\u011Bchto syst\u00E9mech studov\u00E1no pomoc\u00ED vhodn\u00FDch diagnostick\u00FDch metod a z\u00EDskan\u00E9 v\u00FDsledky budou slou\u017Eit jako vstupn\u00ED parametry do modelu po\u010D\u00EDta\u010Dov\u00FDch simulac\u00ED. Hlavn\u00ED c\u00EDle projektu jsou n\u00E1sleduj\u00EDc\u00ED: Optimalizovat pulzn\u00ED zdroje plazmatu pro efektivn\u00ED nan\u00E1\u0161en\u00ED tenk\u00FDch oxidov\u00FDch vrstev: plan\u00E1rn\u00ED magnetron, plazmovou trysku s dutou katodou pracuj\u00EDc\u00EDcmi za n\u00EDzk\u00E9ho tlaku\u00A0a surfatronem buzen\u00FD mikrovlnn\u00FD tryskov\u00FD v\u00FDboj pracuj\u00EDc\u00ED za\u00A0vy\u0161\u0161\u00EDch tlak\u016F. Implementovat do t\u011Bchto zdroj\u016F plazmatu n\u00E1sleduj\u00EDc\u00ED zdokonalen\u00E9 diagnostick\u00E9 metody m\u011B\u0159\u00EDc\u00ED s \u010Dasov\u00FDm rozli\u0161en\u00EDm: elektrostatickou sondu, emisn\u00ED a laserovou absorp\u010Dn\u00ED spektroskopii, hmotovou spektrometrii a m\u011B\u0159en\u00ED energetick\u00E9ho rozd\u011Blen\u00ED iont\u016F. Experiment\u00E1ln\u011B charakterizovat plazmatick\u00E9 procesy prob\u00EDhaj\u00EDc\u00ED v t\u011Bchto zdroj\u00EDch plazmatu a porozum\u011Bt jejich vlivu na vlastnosti nan\u00E1\u0161en\u00FDch nanokrystalick\u00FDch tenk\u00FDch vrstev v\u010Detn\u011B diagnostiky jejich krystalografick\u00E9 struktury a s n\u00ED spjat\u00FDch vlastnost\u00ED. Na z\u00E1klad\u011B v\u00FDsledk\u016F diagnostiky plazmatu a vlastnost\u00ED nanesen\u00FDch vrstev vytvo\u0159it po\u010D\u00EDta\u010Dov\u00E9 simulace r\u016Fstu vrstev a vysv\u011Btlit z\u00E1kladn\u00ED fyzik\u00E1ln\u00ED principy zodpov\u011Bdn\u00E9 za formov\u00E1n\u00ED vrstev." . . . "http://www.isvav.cz/projectDetail.do?rowId=GAP205/11/0386"^^ . . . "GAP205/11/0386" . . "2011-01-01+01:00"^^ . "Pokro\u010Dil\u00FD experiment\u00E1ln\u00ED v\u00FDzkum v\u00FDbojov\u00FDch zdroj\u016F plazmatu pou\u017Eit\u00FDch pro p\u0159\u00EDpravu nanostrukturovan\u00FDch tenk\u00FDch vrstev" . . "P\u0159\u00EDnos projektu spo\u010D\u00EDv\u00E1 v rozvoji sondov\u00FDch diagnostik (modifikovan\u00E1 Katsumata sonda) umo\u017E\u0148uj\u00EDc\u00EDch mapov\u00E1n\u00ED iontov\u00FDch tok\u016F na substr\u00E1t v hybrid- n\u00EDch HiPIMS syst\u00E9mech, v oblasti depozice tenk\u00FDch vrstev (kompozitn\u00ED gradientn\u00ED Ti-Cu vrstvy, \u0159\u00EDzen\u00ED krystalo-grafick\u00E9 struktury TiO2 vrstev p-d parametrem) a v oblasti simulac\u00ED r\u016Fstu vrstev. V\u00FDsledky jsou ve 13 impaktovan\u00FDch publikac\u00EDch."@cs . . . "2014-07-01+02:00"^^ . . "0"^^ . . . "1"^^ . "29"^^ . "Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films"@en . . . "2"^^ . "29"^^ . . "Main outcome of the project consist in the development of probe diagnostics (modified Katsumata probe) enabling mapping of ion flux onto substrate in hybrid MF-HiPIMS systems, in the deposition of thin films (Ti-Cu composite layer with a gradient structure, control of the crystallographic structure of the TiO2 films by p-d parameter) and in simulations of thin film growth (13 published papers)."@en . . . "discharge plasma jet magnetron TiO2"@en . "2013-12-31+01:00"^^ .