. "2007-12-31+01:00"^^ . . "http://www.isvav.cz/projectDetail.do?rowId=GA202/05/2242"^^ . . . . . . "GA202/05/2242" . . "Low-temperature high-pressure plasma systems were investigated and optimized - atmospheric barrier-torch discharge, microwave surfatron with plasma flow and planar dielectric barrier discharge. The advantage of the atmospheric plasma torch was to deposit"@en . . . " atmospheric pressure discharge" . "1"^^ . "plasma technology; atmospheric pressure discharge; thin films"@en . . . "2"^^ . . . . . "B\u011Bhem \u0159e\u0161en\u00ED projektu byl proveden v\u00FDzkum a optimalizace n\u00EDzkoteplotn\u00EDch plazmov\u00FDch syst\u00E9m\u016F pracuj\u00EDc\u00EDhc za vy\u0161\u0161\u00EDho tlaku - atmosf\u00E9rick\u00FD barrier-torch v\u00FDboj, MW plazmov\u00FD surfatron s proud\u00EDcim plazmatem.a plan\u00E1rn\u00ED dielektrick\u00FD barierov\u00FD v\u00FDboj. Atmosf\u00E9rick\u00FD"@cs . "Proposed project will be devoted to research and development of the new enviromentaly safe plasmatic technologies of thin films at the low temperatures of the substrate T< 80 deg C. New systems with plasma jets working at atmospheric pressures will be developed. Although research and development deals with these problematics, this technology was not satisfactory mastered up to now. Main effort will be concentrated on the speci\u00E1l thin oxide films deposited on substrates with different thermal sensitivity. Particularly, TiO*, SiO* eventually Al2Ox and others similar thin films will be deposited, which are suitable and required in various branches of industry. Investigation of flow paterns near the jet output and substrate surface as well as 'In situ' measurement of plasma parameters and thin films properties will be correlated in order to optimize the deposition process."@en . . "2007-05-02+02:00"^^ . "Studium nov\u00FDch n\u00EDzkoteplotn\u00EDch plazmatick\u00FDch zdroj\u016F pracuj\u00EDc\u00EDch za atmosf\u00E9rick\u00E9ho tlaku z hlediska jejich vyu\u017Eit\u00ED pro depozice tenk\u00FDch vrstev" . "0"^^ . "Investigation of new low temperature atmospheric pressure plasma sources for deposition of thin films"@en . "2008-12-16+01:00"^^ . . "Navrhovan\u00FD projekt bude zam\u011B\u0159en na v\u00FDzkum a v\u00FDvoj nov\u00FDch ekologick\u00FDch plazmatick\u00FDch technologi\u00ED depozice tenk\u00FDch vrstev p\u0159i udr\u017Een\u00ED n\u00EDzk\u00FDch teplot substr\u00E1tu T < 80 st C. Vyv\u00EDjeny budou r\u016Fzn\u00E9 syst\u00E9my s proud\u00EDc\u00EDmi plazmov\u00FDmi kan\u00E1ly pracuj\u00EDc\u00EDch za atmosf\u00E9rick\u00E9ho tlaku. P\u0159esto\u017Ee v\u00FDzkum a v\u00FDvoj je v posledn\u00ED dob\u011B intenzivn\u011B zam\u011B\u0159en v tomto sm\u011Bru, probl\u00E9m t\u011Bchto technologi\u00ED nebyl dosud uspokojiv\u011B zvl\u00E1dnut. Pozornost bude zam\u011B\u0159ena na tenk\u00E9 vrstvy speci\u00E1ln\u00EDch oxid\u016F deponovan\u00FDch na r\u016Fzn\u011B tepeln\u011B senzitivn\u00ED substr\u00E1ty. Konkr\u00E9tn\u011B p\u016Fjde p\u0159edev\u0161\u00EDm o TiOx, SiOx p\u0159\u00EDpadn\u011B AbOx vrstvy, vhodn\u00E9 jako ochrann\u00E9, tribologick\u00E9 a fotokatalitick\u00E9 vrstvy \u017E\u00E1dan\u00E9 pro r\u016Fzn\u00E9 pr\u016Fmyslov\u00E9 aplikace. M\u011B\u0159en\u00ED rozlo\u017Een\u00ED proud\u011Bn\u00ED u vy\u00FAst\u011Bn\u00ED trysky a v bl\u00EDzkosti substr\u00E1tu a vlastnost\u00ED plazmatu p\u0159\u00EDmo p\u0159i depozici spolu se studiem parametr\u016F vrstev bude vyu\u017Eito k optimalizaci depozi\u010Dn\u00EDho procesu." . "plasma technology" . "28"^^ . "28"^^ . "2005-01-01+01:00"^^ .