. . "1"^^ . . . . "1"^^ . "Vf plazma hojn\u011B pou\u017E\u00EDvan\u00E9 jak ve v\u00FDzkumu, tak i v aplikac\u00EDch technick\u00E9 praxe, zejm\u00E9na v plazmochemii, je generov\u00E1no v r\u016Fzn\u00FDch atmosf\u00E9r\u00E1ch, \u010Dast\u011Bji za sn\u00ED\u017Een\u00E9ho tlaku. V proud\u00EDc\u00EDch plynech za atmosf\u00E9rick\u00E9ho tlaku je m\u00E9n\u011B pou\u017E\u00EDvan\u00E9 i zn\u00E1m\u00E9. V posledn\u00ED dob\u011Bbyl vyvinut zcela nov\u00FD typ vf v\u00FDboje jednop\u00F3lov\u00E9ho, resp. dvoup\u00F3lov\u00E9ho charakteru, ho\u0159\u00EDc\u00EDho z dut\u00E9 elektrody za norm\u00E1ln\u00EDho tlaku v plynu proud\u00EDc\u00EDm skrze tuto elektrodu p\u0159i vf v\u00FDkonu do 500W, a sou\u010Dasn\u011B plazmochemick\u00E9 za\u0159\u00EDzen\u00ED generuj\u00EDc\u00ED tento v\u00FDboj, tzv.plazmov\u00E1 tu\u017Eka (plasma pencil) (PV 1476-98 CZ). P\u0159edb\u011B\u017En\u00FD v\u00FDzkum uk\u00E1zal, \u017Ee v\u00FDboj podobn\u00FDch vlastnost\u00ED (v\u00FDrazn\u011B neizotermick\u00E9 plazma) lze budit plazmovou tu\u017Ekou za atmosf\u00E9rick\u00E9ho tlaku nejen vf energi\u00ED, ale tak\u00E9 ss, nf a mikrovlnn\u00FDmi zdroji. Sou\u010Dasn\u011B bylodkryta pro praxi velmi zaj\u00EDmav\u00E1 skute\u010Dnost, \u017Ee plazmovou tu\u017Eku lze aplikovat jak v r\u016Fzn\u00FDch plynn\u00FDch m\u00E9di\u00EDch, tak i v kapaln\u00E9m prost\u0159ed\u00ED zvl\u00E1\u0161t\u011B na \u00FApravy povrch\u016F (\u010Di\u0161t\u011Bn\u00ED, ablace, lept\u00E1n\u00ED, depozice vrstev apod.). Aktu\u00E1ln\u00ED f\u00E1z\u00ED v\u00FDzkumu je nyn\u00ED posouzen\u00ED" . . . "0"^^ . "Elementary processes in plasma pencil at atmospheric pressure under different conditions"@en . "Element\u00E1rn\u00ED procesy v plazmov\u00E9 tu\u017Ece ho\u0159\u00EDc\u00ED za atmosf\u00E9rick\u00E9ho tlaku za r\u016Fzn\u00FDch podm\u00EDnek" . "2008-05-19+02:00"^^ . . "GA202/00/0843" . . "High frequency (hf) plasma, which is now frequently used both in research and practical application, especially in plasmachemistry, has been generated in different gases almost at reduced pressure. Discharges burning in flowing gases at atmospheric pressure are less known and used. Recently, a completely new type of hf unipolar/bipolar discharge burning from a hollow electrode at atmospheric pressure in a working gas flowing through the electrode with input hf power up to 500 W and a plasmachemicaldevice for generation of such discharge, called plasma pencil, was developed at the Department (patent No. PV 1476-98 CZ). First results show that the discharge with similar properties can be generated at atmospheric pressure not only by hf generators byalso by means of dc, low frequency and microwave sources. Moreover, it was found that the plasma pencil can also work in liquid solution, which can be used for modification of surfaces (cleaning from corrosion, ablation, etching, deposition of thin films"@en . . "Neuvedeno."@en . . "11"^^ . . "11"^^ . "http://www.isvav.cz/projectDetail.do?rowId=GA202/00/0843"^^ . . "T\u00E9matika grantov\u00E9ho projektu je zam\u011B\u0159ena na zaj\u00EDmavou aplikaci poznatk\u016F fyziky plazmatu v oboru v\u00FDboj\u016F za atmosf\u00E9rick\u00E9ho tlaku. P\u0159es p\u0159ev\u00E1\u017En\u011B aplika\u010Dn\u00ED charakter p\u0159ineslo \u0159e\u0161en\u00ED i nov\u00E9 poznatky v uveden\u00E9m oboru. Uzn\u00E1n\u00ED v\u00FDznamu projektu dokazuj\u00ED jak publi"@cs . . . .