. . "0"^^ . "The aim of the project is to prepare thin-film materials with unique physical and functional properties. They will be synthesized using new high-power pulsed magnetron sputtering techniques without the need for high substrate bias voltages, high substrate temperatures and post-deposition annealing. Benefits of the new magnetron sputtering techniques with highly ionized pulsed plasmas will be utilized in a high-rate reactive deposition of densified oxides (such as HfO2 and Al2O3) and oxynitrides (such as HfON) with controlled structure and properties, and oxynitride coatings with nanoclustered surfaces (such as TaON with Cu, Ag and Ni nanoclusters, having a potential to produce H2 and O2 from water under visible light irradiation). The pulsed magnetron sputtering techniques will be also used for preparation of new multifunctional thin-film materials (multicomponent nitrides and oxynitrides) from the Hf(Ta)(Si)BCN(O) system. The correlations between process parameters and the elemental composition, structure and properties of the formed materials will be explained."@en . "4"^^ . . "4"^^ . . " Optical transparency" . . . "C\u00EDlem projektu je p\u0159\u00EDprava tenkovrstv\u00FDch materi\u00E1l\u016F s unik\u00E1tn\u00EDmi fyzik\u00E1ln\u00EDmi a funk\u010Dn\u00EDmi vlastnostmi. Budou syntetizov\u00E1ny u\u017Eit\u00EDm nov\u00FDch vysokov\u00FDkonov\u00FDch pulzn\u00EDch magnetronov\u00FDch napra\u0161ovac\u00EDch technik bez nutnosti vysok\u00E9ho z\u00E1porn\u00E9ho p\u0159edp\u011Bt\u00ED substr\u00E1t\u016F, vysok\u00FDch teplot substr\u00E1t\u016F a oh\u0159evu po depozici. V\u00FDhody nov\u00FDch magnetronov\u00FDch technik se siln\u011B ionizovan\u00FDm pulzn\u00EDm plazmatem budou vyu\u017Eity p\u0159i vysokorychlostn\u00ED depozici densifikovan\u00FDch oxid\u016F (nap\u0159. HfO2 a Al2O3) a oxynitrid\u016F (nap\u0159. HfON) s \u0159\u00EDzenou strukturou a vlastnostmi a oxynitridov\u00FDch povlak\u016F s nanoklastry na povrchu (nap\u0159. TaON s nanoklastry Cu, Ag a Ni s vysok\u00FDm potenci\u00E1lem vytv\u00E1\u0159et po oz\u00E1\u0159en\u00ED viditeln\u00FDm sv\u011Btlem vod\u00EDk a kysl\u00EDk z vody). Pulzn\u00ED magnetronov\u00E9 techniky budou vyu\u017Eity tak\u00E9 p\u0159i p\u0159\u00EDprav\u011B nov\u00FDch multifunk\u010Dn\u00EDch materi\u00E1l\u016F (multikomponentn\u00ED nitridy a oxynitridy) ze syst\u00E9mu Hf(Ta)(Si)BCN(O). Budou objasn\u011Bny korelace mezi procesn\u00EDmi parametry a prvkov\u00FDm slo\u017Een\u00EDm, strukturou a vlastnostmi vytvo\u0159en\u00FDch materi\u00E1l\u016F." . " Dielectric constant" . . "Nanostructured coatings" . " Thermal stability" . "2014-03-14+01:00"^^ . " Photoactivity" . "Nanostructured coatings, Magnetron sputtering, Highly ionized plasmas, Densified oxides, Oxynitrides, Multicomponent nitrides, Nanoclusters, Hardness, Optical transparency, Dielectric constant, Thermal stability, Oxidation resistance, Photoactivity, Hig\u2026"@en . . "http://www.isvav.cz/projectDetail.do?rowId=GA14-03875S"^^ . " Nanoclusters" . " Highly ionized plasmas" . "Nanostrukturn\u00ED multifunk\u010Dn\u00ED povlaky p\u0159ipraven\u00E9 u\u017Eit\u00EDm siln\u011B ionizovan\u00E9ho pulzn\u00EDho plazmatu" . " Magnetron sputtering" . . " Oxidation resistance" . . " Multicomponent nitrides" . " Oxynitrides" . . . . " Densified oxides" . . "Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas"@en . . "2014-01-01+01:00"^^ . . " Hardness" . . "0"^^ . "GA14-03875S" . "2015-04-23+02:00"^^ . "2016-12-31+01:00"^^ . "1"^^ . .