. . "Electron-beam lithography for preparation of nanostructures"@en . "2007-10-16+02:00"^^ . . "0"^^ . . . . . . "Neuvedeno."@en . . . . "St\u00E1vaj\u00EDc\u00ED syst\u00E9m elektronov\u00E9ho litografii BS 600 m\u00E1 mezn\u00ED rozli\u0161en\u00ED 0.1 mikronu. V posledn\u00ED dob\u011B se objevila \u0159ada po\u017Eadavk\u016F na realizaci struktur s lep\u0161\u00EDm rozli\u0161en\u00EDm. C\u00EDlem projektu je studium realizace struktur s rozli\u0161en\u00EDm lep\u0161\u00EDm ne\u017E 100 nanometr\u016F. P\u0159i\u0159e\u0161en\u00ED je nutno br\u00E1t v \u00FAvahu jednak \u00FApravu vlastn\u00EDho litografick\u00E9ho syst\u00E9mu a jednak technologick\u00E9 po\u017Eadavky vypl\u00FDvaj\u00EDc\u00EDz realizace struktur s t\u00EDmto velk\u00FDm rozli\u0161en\u00EDm. V\u00FDsledkem projektu by m\u011Bly b\u00FDt postupy a techniky pro realizaci nanostruktur a vzorov\u00E9 struktury p\u0159ipraven\u00E9 v tomto rozli\u0161en\u00ED." . . . . . "Elektronov\u00E1 litografie pro p\u0159\u00EDpravu nanostruktur" . "6"^^ . "Actual electron-beam lithographic system BS 600 works with the limit resolution of 0.1 microns. Recently,we have received a couple of requirements for production of structures with better resolution.The aim of this project is to study a preparation of structures with the resolution below 100 nanometers. Thesolution has to address both the system part of the lithograph and the technological tissues concerning such a high resolution. As a result, nanostructures with extremely high resolution will be"@en . "6"^^ . "0"^^ . . "GA102/05/2325" . . "1"^^ . "Basic parameters of the e-beam writing system BS600 were improved. This results in a\u00A0high speed system with sub 100 nm resolution. The most important tasks were:Decreasing the beam size by the factor of 2 (from 100 nm to 50 nm), theoretical analysis and"@en . . "http://www.isvav.cz/projectDetail.do?rowId=GA102/05/2325"^^ . "V r\u00E1mci \u0159e\u0161en\u00ED projektu bylo dosa\u017Eeno zlep\u0161en\u00ED parametr\u016F vlastn\u00EDho litografu i\u00A0cel\u00E9 litografick\u00E9 technologie. Nosn\u00E9 body zahrnuj\u00ED zejm\u00E9na:Zmen\u0161en\u00ED minim\u00E1ln\u00EDho rozm\u011Bru svazku 2x (z p\u016Fvodn\u00EDch 100 nm na 50 nm); praktick\u00E9 realizaci p\u0159edch\u00E1zela d\u016Fsledn\u00E1 teore"@cs . . .