"P\u0159edkl\u00E1dan\u00FD projekt se zab\u00FDv\u00E1 studiem proud\u00EDc\u00EDch plazmatick\u00FDch kan\u00E1l\u016F v plazmochemick\u00E9m reaktoru s dut\u00FDmi katodami p\u0159i depozici tenk\u00FDch vrstev. \u00DA\u010Delem tohoto studia bude snaha o porozum\u011Bn\u00ED proces\u016Fm v reaktivn\u00EDm plazmatu ovliv\u0148uj\u00EDc\u00EDch r\u016Fst tenk\u00FDch vrstev.Toto studium by m\u011Blo umo\u017Enit lep\u0161\u00ED vyu\u017Eit\u00ED a optimalizaci t\u011Bchto technologi\u00ED. V\u00FDbojov\u00E9 plazma v dut\u00FDch katod\u00E1ch a plazmatick\u00FDch kan\u00E1lech bude buzeno RF, modulovan\u00FDm RF, DC a DC pulzn\u00EDm zdrojem. M\u011B\u0159en\u00ED parametr\u016F proud\u00EDc\u00EDch kan\u00E1l\u016F bude realizov\u00E1no pomoc\u00EDemisn\u00ED spektroskopie plazmatu spektrometrem TRIAX Joben Yvon vybaven\u00E9ho CCD detektorem citliv\u00FDm v UV a viditeln\u00E9 oblasti a foton\u00E1sobi\u010Dov\u00FDm syst\u00E9mem s rychlou odezvou. Tyto experimenty budou d\u00E1le dopln\u011Bny m\u011B\u0159en\u00EDm RF kompenzovanou Langmuirovou sondou.M\u011B\u0159en\u00ED parametr\u016F plazmatu bude provedeno p\u0159i depozici ZnO orientovan\u00FDch polykrystalick\u00FDch vrstev (osa c kolm\u00E1 k povrchu substr\u00E1tu) a analogick\u00FDch vrstev dopovan\u00FDch definovan\u00FDm mno\u017Estv\u00EDm lithia. Pro tento \u00FA\u010Del bude pou\u017Eito reaktivn\u00ED rozpra\u0161ov\u00E1n\u00ED Zn nebo"@cs . . . "1"^^ . . "1800"^^ . "Studium fyzik\u00E1ln\u00EDch vlastnost\u00ED a aplikac\u00ED n\u00EDzkotlak\u00E9ho plazmochemick\u00E9ho reaktoru se syst\u00E9mem plazmatick\u00FDch kan\u00E1l\u016F pro depozici tenk\u00FDch vrstev"@cs . . . "3"^^ . "0"^^ . . "3"^^ . "Neuvedeno."@en . . "Investigation of physical properties and applications of the low pressure plasma-chemical reactor with the system plasma jet channels for thin films deposition"@en . . "676"^^ . "Proposal project deals with a study of plasma jet channels in the plasma chemical reactor with hollow cathodes during the deposition of thin films. Purpose of this study will be a better understanding of processes in the reactive plasma effecting growthprocesses of deposited films. This study should extend applicability and lead to optimization of these technologies. Hollow cathode discharge plasma will be generated by RF, modulated RF, DC, and pulsed DC sources. Plasma jet parameters will be measuredby emission spectroscopy. Spectrometer TRIAX Joben Yvon equipped with UV-VIS CCD detector and with fast response photomultiplier detector will be used for that purpose. In addition a measurement with RF compensated Langmuir probe will be employed aswell. Investigation of the plasma parameters will be done during the deposition of oriented polycrystalline ZnO thin films (c axis perpendicular to the substrate surface) and those similar films doped by Lithium. For that purpose, Zn or composed Zn"@en . . "0"^^ . . .