. . "8"^^ . . . "8"^^ . "Silik\u00E1tov\u00E9 krystalick\u00E9 materi\u00E1ly po pr\u016Fchodu proudem n\u00EDzkoteplotn\u00EDho plazmatu"@cs . . . . "Pro plazmov\u00E9 nan\u00E1\u0161en\u00ED se prakticky pou\u017E\u00EDv\u00E1 jedin\u00FD silik\u00E1tov\u00FD materi\u00E1l a to zirkon. Zirkon po pr\u016Fchodu plazmatem a rychl\u00E9m ochlazen\u00ED (10 na 3 a\u017E 10 na 6 0C/sec) vytv\u00E1\u0159\u00ED povlak slo\u017Een\u00FD z t-Zr-O2 a amorfn\u00EDho SiO2. Nikdy nebyly pro plazmov\u00E9 nan\u00E1\u0161en\u00ED pou\u017Eityforsteritov\u00E9 materi\u00E1ly, cordieritov\u00E9 materi\u00E1ly, wollastonit nebo p\u0159\u00EDrodn\u00ED silik\u00E1tov\u00E9 materi\u00E1ly typu gran\u00E1t\u016F \u010Di \u010Dedi\u010De. Jen ojedin\u011Bl\u00E9 jsou zm\u00EDnky o pou\u017Eit\u00ED mullitu nav\u00EDc bez odpov\u00EDdaj\u00EDc\u00EDch materi\u00E1lov\u00FDch \u00FAdaj\u016F. navrhujeme pou\u017E\u00EDt v\u00FD\u0161e uveden\u00FDch materi\u00E1l\u016F p ro plazmov\u00FD n\u00E1st\u0159ik a sledovat jejich schopnost tvo\u0159it souvisl\u00FD povlak nebo vrstvu. C\u00EDlem je vytvo\u0159en\u00ED povlak\u016F nebo vrstev neobvykl\u00E9ho f\u00E1zov\u00E9ho slo\u017Een\u00ED tvo\u0159en\u00FDch krystalickou a amorfn\u00ED slo\u017Ekou p\u0159\u00EDp. jen slo\u017Ekou amorfn\u00ED. Na z\u00EDskan\u00FDch vzorc\u00EDch budou provedeny z\u00E1kladn\u00ED materi\u00E1lov\u00E9 zkou\u0161ky a m\u011B\u0159en\u00ED. Praktick\u00FDm v\u00FDsledkem by mohl b\u00FDt nov\u00FD n\u00E1st\u0159ikov\u00FD materi\u00E1l pro plazmov\u00E9 nan\u00E1\u0161en\u00ED resp. pro takto vytv\u00E1\u0159en\u00E9 samonosn\u00E9 prvky."@cs . "0"^^ . "1"^^ . . "Plasma spraying of silicates"@en . "1"^^ . . "1143"^^ . "1143"^^ . . ""@en . .