. "1"^^ . "2550"^^ . . "1"^^ . "Neuvedeno."@en . "6"^^ . "The project proposal suggests to design and build an UV optical apparatus for in situ monitoring of areal thickness- and optical homogeneity of thin films. The method and selected UV wavelength region suggested for this task represents an unique approach, which to the best knowledge of the applicant, has not been used for similar in situ applications yet. The main advantage of the use of UV probing light consists in the fact that the changes in the reflectivity in the UV light region are more sensitive to the variations of film thicknesses than in the VIS-light region, particularly in case of thinner films. The project proposal is based on the knowledge and expertise of the applicant's team achieved during a former GACR project aimed at the development of similar apparatus in the VIS-light region. The possible outcome of the project proposal would be a patented design of the PC-controlled instrument working in the UV range (from 200 nm to 400 nm) of the probing light. A significant part of"@en . . "6"^^ . . . . . . . . . "Design and construction of an Ultra-violet optical apparatus for in situ measurements of areal optical homogeneity of thin films prepared by IBAD"@en . "N\u00E1vrh a konstrukce UV optick\u00E9ho m\u011B\u0159ic\u00EDho za\u0159\u00EDzen\u00ED k in situ monitorov\u00E1n\u00ED plo\u0161n\u00E9 homogenity r\u016Fstu tenk\u00FDch vrstev deponovan\u00FDch metodou IBAD"@cs . "0"^^ . "1682"^^ . . "C\u00EDlem pod\u00E1van\u00E9ho projektu je n\u00E1vrh a konstrukce optick\u00E9ho m\u011B\u0159ic\u00EDho p\u0159\u00EDstroje ur\u010Den\u00E9ho k in situ monitorov\u00E1n\u00ED plo\u0161n\u00E9 homogenity tlou\u0161\u0165ky a optick\u00FDch parametr\u016F tenk\u00FDch vrstev. Zvolen\u00E1 metoda a rozsah vlnov\u00FDch d\u00E9lek pou\u017Eit\u00E9ho sv\u011Btla p\u0159edstavuj\u00ED ojedin\u011Bl\u00FD p\u0159\u00EDstup k \u0159e\u0161en\u00ED dan\u00E9ho probl\u00E9mu, kter\u00FD podle dostupn\u00FDch znalost\u00ED \u010Dlen\u016F t\u00FDmu navrhovatele doposud nebyl k podobn\u00FDm \u00FA\u010Del\u016Fm pou\u017Eit. Jednou z velk\u00FDch v\u00FDhod u\u017Eit\u00ED UV sv\u011Btla je vy\u0161\u0161\u00ED citlivost z\u00E1vislosti spektr\u00E1ln\u00ED odrazivosti na zm\u011Bny tlou\u0161\u0165ky rostouc\u00ED (odpra\u0161ovan\u00E9) tenk\u00E9 vrstvy, ne\u017E je tomu v p\u0159\u00EDpad\u011B pou\u017Eit\u00ED sv\u011Btla o vlnov\u00E9 d\u00E9lce z viditeln\u00E9 oblasti. Toto plat\u00ED obzvl\u00E1\u0161t\u011B pro velmi tenk\u00E9 vrstvy. N\u00E1vrh a \u0159e\u0161en\u00ED navrhovan\u00E9ho projektu je zalo\u017Eeno na znalostech a poznatc\u00EDch \u010Dlen\u016F t\u00FDmu navrhovatele, kter\u00E9 byly z\u00EDsk\u00E1ny v pr\u016Fb\u011Bhu \u00FAsp\u011B\u0161n\u00E9ho \u0159e\u0161en\u00ED p\u0159edchoz\u00EDho projektu GA\u010CR 101/98/0772, kter\u00FD se zab\u00FDval v\u00FDvojem a konstrukc\u00ED podobn\u00E9ho za\u0159\u00EDzen\u00ED pracuj\u00EDc\u00EDm ve viditeln\u00E9 oblasti spektra. P\u0159edpokl\u00E1dan\u00FDm v\u00FDstupem navrhovan\u00E9ho projektu by m\u011Bla b\u00FDt registrace tohoto"@cs .