. . . "9162"^^ . . "1"^^ . . . "atmospheric plasma;thin films deposition;plasma jet;barrier coatings;ellipsometry;emission spectroscopy"@en . "4920"^^ . "Nov\u00E9 n\u00EDzkoteplotn\u00ED plazmatick\u00E9 technologie depozice tenk\u00FDch vrstev za atmosf\u00E9rick\u00E9ho tlaku"@cs . "Proposed project will be devoted to applied research and development of the new environmentally safe plasmatic technologies of thin films at the low temperatures of the substrate T< 80 deg C. New systems with plasma jets working at atmospheric pressures will be developed. Although research and development deals with these problems, this technology was not satisfactory mastered up to now. Main effort will be concentrated on the optically transparent thin oxide films deposited on plastic substrates. Particularly, it will be deposited doped ZnO, In2O3:Sn thin films and others similar which are suitable and required in industry applications. The next kind of deposited materials will be anti corrosive barrier coatings of aluminum alloys by Al2O3 and CeO2 films. 'In situ' measurement of plasma parameters and thin films properties will be correlated in order to optimize the deposition process."@en . . . "0"^^ . "New low temperature plasmatic technologies of thin films deposition at atmospheric pressure"@en . "8"^^ . . . "0"^^ . "Navrhovan\u00FD projekt bude zam\u011B\u0159en na c\u00EDlen\u00FD v\u00FDzkum a v\u00FDvoj nov\u00FDch ekologick\u00FDch plazmatick\u00FDch technologi\u00ED depozice tenk\u00FDch vrstev p\u0159i udr\u017Een\u00ED n\u00EDzk\u00FDch teplot substr\u00E1tu T < 80 st C. Vyv\u00EDjeny budou r\u016Fzn\u00E9 syst\u00E9my s proud\u00EDc\u00EDmi plazmov\u00FDmi kan\u00E1ly pracuj\u00EDc\u00EDch za atmosf\u00E9rick\u00E9ho tlaku. P\u0159esto\u017Ee v\u00FDzkum a v\u00FDvoj je v posledn\u00ED dob\u011B intenzivn\u011B zam\u011B\u0159en v tomto sm\u011Bru, probl\u00E9m t\u011Bchto technologi\u00ED nebyl dosud uspokojiv\u011B zvl\u00E1dnut. Pozornost bude zam\u011B\u0159ena na tenk\u00E9 vrstvy opticky transparentn\u00EDch vodiv\u00FDch oxid\u016F deponovan\u00E9 na plastov\u00E9 substr\u00E1ty. Konkr\u00E9tn\u011B p\u016Fjde o dopovan\u00E9 ZnO, In2O3:Sn vrstvy a podobn\u011B, kter\u00E9 jsou vhodn\u00E9 a \u017E\u00E1dan\u00E9 pro aplikace v pr\u016Fmyslu. Dal\u0161\u00ED c\u00EDlov\u00FDm druhem deponovan\u00FDch materi\u00E1l\u016F budou antikorozn\u00ED bari\u00E9rov\u00E9 povlaky hlin\u00EDkov\u00FDch slitin vrstvami Al2O3 a CeO2. M\u011B\u0159en\u00ED vlastnost\u00ED plazmatu p\u0159\u00EDmo p\u0159i depozici a parametr\u016F vrstev bude vyu\u017Eito k optimalizaci depozi\u010Dn\u00EDho procesu."@cs . "8"^^ . .