"3736"^^ . "2"^^ . . "Novel Laser-based Hybrid Technologies for thin Film Deposition"@en . "The development of novel and modified thin film deposition techniques, study of their possibilities and characterization of discharge plasma is very important for creation of new types of thin films, multilayers, complex and doped layers, graded coatings, waveguiding films, nanostructures, etc. The improvement of present deposition systems, and construction of new hybrid deposition techniques, is necessary. Our attention will be focused on development of systems combining pulsed laser deposition witah concentrated RF and hollow cathode discharges, and magnetron sputtering. The RF biasing and laser modification of the film surface sill be also applied to inhance density and crystallization of the growing films. Formation processes in discharge plasma will be studied by diode-laser spectroscopy, OES, Langmuir probes and CCD camera. Films will be characterized by WDX, XRD, XPS, STM, SEM, Raman spectroscopy and spectroscopic ellipsometry. Microhardness and adhesion will be also tested."@en . "11286"^^ . "V\u00FDvoj nov\u00FDch a modifikovan\u00FDch depozi\u010Dn\u00EDch technik, studium jejich mo\u017Enost\u00ED a charakterizace plazmy jsou velmi d\u016Fle\u017Eit\u00E9 pro tvorbu nov\u00FDch typ\u016F tenk\u00FDch vrstev a multivrstev, slo\u017Eit\u00FDch a dopovan\u00FDch vrstev, gradovan\u00FDch pokryt\u00ED a vrstev s prom\u011Bnn\u00FDm materi\u00E1lov\u00FDm profilem, vlnovodov\u00FDch vrstev, nanostruktur, atd. Tyto \u00FAkoly vy\u017Eaduj\u00ED zdokonalen\u00ED sou\u010Dasn\u00E9 depozi\u010Dn\u00ED techniky a v\u00FDvoj nov\u00FDch hybridn\u00EDch depozi\u010Dn\u00EDch syst\u00E9m\u016F. Na\u0161e pozornost bude soust\u0159ed\u011Bna na v\u00FDvoj syst\u00E9m\u016F kombinuj\u00EDc\u00EDch pulsn\u00ED laserovou depozici s RF v\u00FDboje, v\u00FDbojem v dut\u00E9 katod\u011B a s magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm. Zlep\u0161en\u00E9 krystalizace a zhutn\u011Bn\u00ED vrstev bude dosa\u017Eeno pomoc\u00ED RF polarizace a laserov\u00E9 modifikace povrchu podlo\u017Eky. Procesy ve v\u00FDbojov\u00E9m plazmatu budou studov\u00E1ny pomoc\u00ED diodov\u00E9 laserov\u00E9 spektroskopie, OES, Langmuirovsk\u00FDch sond a CCD kamery. Vrstvy budou charakterizov\u00E1ny pomoc\u00ED WDX, XRD, XPS, STM, SEM, Ramanovsk\u00E9 spektroskopie a spektroskopick\u00E9 elipsometrie. M\u011B\u0159eny budou tak\u00E9 mikrotvrdost a adheze vrstev."@cs . . . "0"^^ . . . . "Nov\u00E9 laserov\u00E9 hybridn\u00ED technologie pro depozici tenk\u00FDch vrstev"@cs . . "45"^^ . . "45"^^ . "1"^^ . "Pulsed laser deposition; thin films; laser plasma; hybrid deposition techniques; radiofrequency discharge; hollow cathode discharge; optical emission spectroscopy; magnetron sputtering; plasma processes"@en . . . .