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Statements

Subject Item
n2:RIV%3AJ23%2F98%3A0032742%21RIV%2F1998%2FMSM%2FMSM8X10
rdf:type
n14:Vysledek skos:Concept
dcterms:title
Formation of nanocrystalline NiCr-N films by reactive dc magnetron sputtering Formation of nanocrystalline NiCr-N films by reactive dc magnetron sputtering
skos:prefLabel
Formation of nanocrystalline NiCr-N films by reactive dc magnetron sputtering Formation of nanocrystalline NiCr-N films by reactive dc magnetron sputtering
skos:notation
RIV:J23/98:0032742!RIV/1998/MSM/MSM8X10
n3:strany
3301;3304
n3:aktivita
n5:P
n3:aktivity
P(GV106/96/K245)
n3:cisloPeriodika
č.^6
n3:dodaniDat
n12:1998
n3:domaciTvurceVysledku
n9:3722619 n9:9269606
n3:druhVysledku
n8:J
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
767893
n3:idVysledku
RIV:J23/98:0032742
n3:kontrolniKodProRIV
[A70E4B7C3556]
n3:nazevZdroje
Journal of Vacuum Science and Technology
n3:obor
n15:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:projekt
n10:GV106%2F96%2FK245
n3:rokUplatneniVysledku
n12:1998
n3:svazekPeriodika
Vol.^16
n3:tvurceVysledku
Musil, Jindřich Regent, Filip
s:issn
0734-2101
s:numberOfPages
0
n11:organizacniJednotka
23520