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Statements

Subject Item
n2:RIV%2F70883521%3A28610%2F11%3A43867336%21RIV12-MSM-28610___
rdf:type
skos:Concept n12:Vysledek
dcterms:description
The adhesion of yeast cells on organosilicon thin films deposited on polycarbonate substrate was investigated. Organosilicon thin films were prepared using atmospheric pressure surface barrier discharge. The adhesion of yeast cells on organosilicon thin films deposited on polycarbonate substrate was investigated. Organosilicon thin films were prepared using atmospheric pressure surface barrier discharge.
dcterms:title
Preparation and characterization of organosilicon thin films for selective adhesion of yeast cells Preparation and characterization of organosilicon thin films for selective adhesion of yeast cells
skos:prefLabel
Preparation and characterization of organosilicon thin films for selective adhesion of yeast cells Preparation and characterization of organosilicon thin films for selective adhesion of yeast cells
skos:notation
RIV/70883521:28610/11:43867336!RIV12-MSM-28610___
n12:predkladatel
n13:orjk%3A28610
n4:aktivita
n14:Z
n4:aktivity
Z(MSM7088352101)
n4:dodaniDat
n9:2012
n4:domaciTvurceVysledku
n11:2029650
n4:druhVysledku
n17:O
n4:duvernostUdaju
n7:S
n4:entitaPredkladatele
n10:predkladatel
n4:idSjednocenehoVysledku
223040
n4:idVysledku
RIV/70883521:28610/11:43867336
n4:jazykVysledku
n16:eng
n4:klicovaSlova
organosilicon layer, plasma treatment, yeast, surface modification
n4:klicoveSlovo
n6:organosilicon%20layer n6:plasma%20treatment n6:yeast n6:surface%20modification
n4:kontrolniKodProRIV
[B99945CF2123]
n4:obor
n5:JK
n4:pocetDomacichTvurcuVysledku
1
n4:pocetTvurcuVysledku
1
n4:rokUplatneniVysledku
n9:2011
n4:tvurceVysledku
Lehocký, Marián
n4:zamer
n15:MSM7088352101
n18:organizacniJednotka
28610