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Statements

Subject Item
n2:RIV%2F70883521%3A28610%2F09%3A63508003%21RIV10-MSM-28610___
rdf:type
n4:Vysledek skos:Concept
dcterms:description
The bacterial strains of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 were selected for adhesion study on Teflon-like or organosilicon thin films deposited on paper substrate in atmospheric pressure surface barrier discharge. As a carrier gas the nitrogen with small admixture of octafluorocyclobutane or hexamethylenedisiloxane was used. The influence of octafluorocyclobutane and hexamethylenedisiloxane flowrate ratio on later cell adhesion was studied. The cell attachment was evaluated by means of the luminometric measurement of the ATP extracted from adhered cells. The surface properties of deposited layers were investigated by means contact angle measurement and chemical properties of deposited films were studied by means of FTIR spectroscopy. Optical emission spectroscopy was used for investigation of plasma parameters of used plasma. The bacterial strains of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 were selected for adhesion study on Teflon-like or organosilicon thin films deposited on paper substrate in atmospheric pressure surface barrier discharge. As a carrier gas the nitrogen with small admixture of octafluorocyclobutane or hexamethylenedisiloxane was used. The influence of octafluorocyclobutane and hexamethylenedisiloxane flowrate ratio on later cell adhesion was studied. The cell attachment was evaluated by means of the luminometric measurement of the ATP extracted from adhered cells. The surface properties of deposited layers were investigated by means contact angle measurement and chemical properties of deposited films were studied by means of FTIR spectroscopy. Optical emission spectroscopy was used for investigation of plasma parameters of used plasma.
dcterms:title
Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces
skos:prefLabel
Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces
skos:notation
RIV/70883521:28610/09:63508003!RIV10-MSM-28610___
n3:aktivita
n15:P n15:Z
n3:aktivity
P(GA202/05/0777), Z(MSM0021622411), Z(MSM7088352101)
n3:cisloPeriodika
6
n3:dodaniDat
n14:2010
n3:domaciTvurceVysledku
n5:8588716 n5:2029650 n5:4559444
n3:druhVysledku
n10:J
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
354922
n3:idVysledku
RIV/70883521:28610/09:63508003
n3:jazykVysledku
n12:eng
n3:klicovaSlova
Rhodococcus; Plasma Deposition; Cell adhesion; Barrier discharge; Thin films
n3:klicoveSlovo
n9:Thin%20films n9:Plasma%20Deposition n9:Rhodococcus n9:Cell%20adhesion n9:Barrier%20discharge
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[56D58E66356C]
n3:nazevZdroje
Journal of Materials Processing Technology
n3:obor
n11:CD
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
6
n3:projekt
n16:GA202%2F05%2F0777
n3:rokUplatneniVysledku
n14:2009
n3:svazekPeriodika
209
n3:tvurceVysledku
Koutný, Marek Institoris, Jakub Čech, Jan Lehocký, Marián Mráček, Aleš Sťahel, Pavel
n3:zamer
n13:MSM7088352101 n13:MSM0021622411
s:issn
0924-0136
s:numberOfPages
5
n8:organizacniJednotka
28610