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Statements

Subject Item
n2:RIV%2F68407700%3A21460%2F08%3A12148102%21RIV09-MSM-21460___
rdf:type
n14:Vysledek skos:Concept
dcterms:description
Thin SiC x films were fabricated by hybrid laser-magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700°C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400-1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions. Tenké SiCx vrstvy byly připravené pomocí hybridní laserové magnetronové depozice. Thin SiC x films were fabricated by hybrid laser-magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700°C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400-1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions.
dcterms:title
Tenké SiCx vrstvy připravené pomocí hybridní laserové magnetronové depozice Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition
skos:prefLabel
Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition Tenké SiCx vrstvy připravené pomocí hybridní laserové magnetronové depozice Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition
skos:notation
RIV/68407700:21460/08:12148102!RIV09-MSM-21460___
n3:aktivita
n6:Z n6:S n6:P
n3:aktivity
P(GA202/06/0216), S, Z(AV0Z10100522), Z(MSM6840770012)
n3:cisloPeriodika
3
n3:dodaniDat
n5:2009
n3:domaciTvurceVysledku
n18:1722247 n18:7895712
n3:druhVysledku
n17:J
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n12:predkladatel
n3:idSjednocenehoVysledku
399971
n3:idVysledku
RIV/68407700:21460/08:12148102
n3:jazykVysledku
n13:eng
n3:klicovaSlova
hybrid laser-magnetron deposition; thin layer
n3:klicoveSlovo
n4:hybrid%20laser-magnetron%20deposition n4:thin%20layer
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[E1B57A2979A1]
n3:nazevZdroje
Applied Physics A: Materials Science and Processing
n3:obor
n10:BH
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
5
n3:projekt
n9:GA202%2F06%2F0216
n3:rokUplatneniVysledku
n5:2008
n3:svazekPeriodika
93
n3:tvurceVysledku
Novotný, M. Kocourek, Tomáš Jelínek, Miroslav Kadlec, J. Zemek, J.
n3:wos
000260218400010
n3:zamer
n16:MSM6840770012 n16:AV0Z10100522
s:issn
0947-8396
s:numberOfPages
5
n11:organizacniJednotka
21460