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Statements

Subject Item
n2:RIV%2F68407700%3A21340%2F14%3A00226451%21RIV15-MSM-21340___
rdf:type
n18:Vysledek skos:Concept
dcterms:description
Short-wavelength ablation of poly(1,4-phenylene ether-ether-sulfone) (PPEES) and poly(methyl methacrylate) (PMMA) was investigated using extreme ultraviolet (XUV) and soft x-ray (SXR) radiation from plasma-based sources. The initial experiment was performed with a 10 Hz desktop capillary-discharge XUV laser lasing at 46.9 nm. The XUV laser beam was focused onto the sample by a spherical mirror coated with a Si/Sc multilayer. The same materials were irradiated with 13.5 nm radiation emitted by plasmas produced by focusing an optical laser beam onto a xenon gas-puff target. A Schwarzschild focusing optics coated with a Mo/Si multilayer was installed at the source to achieve energy densities exceeding 0.1 J cm(-2) in the tight focus. The existing experimental system at the Laser Laboratorium Gottingen was upgraded by implementing a 1.2 J driving laser. An increase of the SXR fluence was secured by improving the alignment technique Short-wavelength ablation of poly(1,4-phenylene ether-ether-sulfone) (PPEES) and poly(methyl methacrylate) (PMMA) was investigated using extreme ultraviolet (XUV) and soft x-ray (SXR) radiation from plasma-based sources. The initial experiment was performed with a 10 Hz desktop capillary-discharge XUV laser lasing at 46.9 nm. The XUV laser beam was focused onto the sample by a spherical mirror coated with a Si/Sc multilayer. The same materials were irradiated with 13.5 nm radiation emitted by plasmas produced by focusing an optical laser beam onto a xenon gas-puff target. A Schwarzschild focusing optics coated with a Mo/Si multilayer was installed at the source to achieve energy densities exceeding 0.1 J cm(-2) in the tight focus. The existing experimental system at the Laser Laboratorium Gottingen was upgraded by implementing a 1.2 J driving laser. An increase of the SXR fluence was secured by improving the alignment technique
dcterms:title
Short-wavelength ablation of polymers in the high-fluence regime Short-wavelength ablation of polymers in the high-fluence regime
skos:prefLabel
Short-wavelength ablation of polymers in the high-fluence regime Short-wavelength ablation of polymers in the high-fluence regime
skos:notation
RIV/68407700:21340/14:00226451!RIV15-MSM-21340___
n4:aktivita
n8:I n8:P
n4:aktivity
I, P(ED2.1.00/01.0027), P(EE2.3.20.0143), P(LD14032)
n4:cisloPeriodika
May
n4:dodaniDat
n17:2015
n4:domaciTvurceVysledku
n10:6576540 Liberatore, Chaira
n4:druhVysledku
n13:J
n4:duvernostUdaju
n15:S
n4:entitaPredkladatele
n12:predkladatel
n4:idSjednocenehoVysledku
44754
n4:idVysledku
RIV/68407700:21340/14:00226451
n4:jazykVysledku
n7:eng
n4:klicovaSlova
extreme ultraviolet; soft x-ray; ablation; polymers
n4:klicoveSlovo
n14:ablation n14:soft%20x-ray n14:extreme%20ultraviolet n14:polymers
n4:kodStatuVydavatele
SE - Švédské království
n4:kontrolniKodProRIV
[88C9A164ECEE]
n4:nazevZdroje
Physica Scripta
n4:obor
n11:BH
n4:pocetDomacichTvurcuVysledku
2
n4:pocetTvurcuVysledku
9
n4:projekt
n5:ED2.1.00%2F01.0027 n5:EE2.3.20.0143 n5:LD14032
n4:rokUplatneniVysledku
n17:2014
n4:svazekPeriodika
T161
n4:tvurceVysledku
Rocca, J. J. Mocek, Tomáš Mann, K. Vyšín, L. Endo, A. Juha, Libor Liberatore, Chaira Müller, M. Pína, Ladislav
n4:wos
000339620200067
s:issn
0031-8949
s:numberOfPages
4
n16:doi
10.1088/0031-8949/2014/T161/014066
n19:organizacniJednotka
21340