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Statements

Subject Item
n2:RIV%2F68407700%3A21340%2F14%3A00218871%21RIV15-GA0-21340___
rdf:type
skos:Concept n17:Vysledek
rdfs:seeAlso
http://www.iwepnm.org/fileadmin/announcements/2014/IWEPNM_2014_abstractbook.pdf
dcterms:description
Structured diamond films are required for several uses as photonic crystals, (bio-) sensors, biomedicine, etc. Often, these uses require fabrication of nano-sized features with assistance of EBL or FIB techniques. However, EBL/FIB techniques are expensive and time consuming; especially for processing large areas. Nanosphere lithography offers an economically acceptable alternative. Here we present a technology which allows a fabrication of periodically ordered diamond nano-structures over large areas. The technological process starts with the deposition of polystyrene spheres (PS) monolayer (spheres 250 or 471 nm) on seeded quartz or Si substrates by Langmuir-Blodgett method. The self-assembled PS are employed as a mask for reactive ion etching (RIE) used for reducing a PS diameter to 100 and 200 nm, respectively. The processed substrates are finally used for growing arrays of ordered diamond nano-structures. The geometry of formed arrays is controlled by PS diameter (100-1500 nm) and RIE parameters. The presented technology is simple and cheap, and allows a preparation of periodically ordered diamond hollows. This work was supported by the grants P108/12/G108 and P205/13/20110S. Structured diamond films are required for several uses as photonic crystals, (bio-) sensors, biomedicine, etc. Often, these uses require fabrication of nano-sized features with assistance of EBL or FIB techniques. However, EBL/FIB techniques are expensive and time consuming; especially for processing large areas. Nanosphere lithography offers an economically acceptable alternative. Here we present a technology which allows a fabrication of periodically ordered diamond nano-structures over large areas. The technological process starts with the deposition of polystyrene spheres (PS) monolayer (spheres 250 or 471 nm) on seeded quartz or Si substrates by Langmuir-Blodgett method. The self-assembled PS are employed as a mask for reactive ion etching (RIE) used for reducing a PS diameter to 100 and 200 nm, respectively. The processed substrates are finally used for growing arrays of ordered diamond nano-structures. The geometry of formed arrays is controlled by PS diameter (100-1500 nm) and RIE parameters. The presented technology is simple and cheap, and allows a preparation of periodically ordered diamond hollows. This work was supported by the grants P108/12/G108 and P205/13/20110S.
dcterms:title
Fabrication of periodically ordered diamond nano-structures by nanosphere lithography Fabrication of periodically ordered diamond nano-structures by nanosphere lithography
skos:prefLabel
Fabrication of periodically ordered diamond nano-structures by nanosphere lithography Fabrication of periodically ordered diamond nano-structures by nanosphere lithography
skos:notation
RIV/68407700:21340/14:00218871!RIV15-GA0-21340___
n3:aktivita
n18:P
n3:aktivity
P(GA13-20110S)
n3:dodaniDat
n10:2015
n3:domaciTvurceVysledku
n6:1802364 n6:3244830
n3:druhVysledku
n4:O
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n5:predkladatel
n3:idSjednocenehoVysledku
16293
n3:idVysledku
RIV/68407700:21340/14:00218871
n3:jazykVysledku
n7:eng
n3:klicovaSlova
reactive ion etching; RIE; sensors; nanodiamond
n3:klicoveSlovo
n8:reactive%20ion%20etching n8:nanodiamond n8:RIE n8:sensors
n3:kontrolniKodProRIV
[46CD8A0A40C8]
n3:obor
n15:JK
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
5
n3:projekt
n11:GA13-20110S
n3:rokUplatneniVysledku
n10:2014
n3:tvurceVysledku
Domonkos, Mária Proška, Jan Kromka, A. Ižák, T. Štolcová, Lucie
n12:organizacniJednotka
21340