This HTML5 document contains 47 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n16http://localhost/temp/predkladatel/
n15http://linked.opendata.cz/resource/domain/vavai/projekt/
n12http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n6http://linked.opendata.cz/resource/domain/vavai/subjekt/
n5http://linked.opendata.cz/ontology/domain/vavai/
shttp://schema.org/
rdfshttp://www.w3.org/2000/01/rdf-schema#
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n21http://bibframe.org/vocab/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n19http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F68407700%3A21340%2F13%3A00215709%21RIV14-MSM-21340___/
n17http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n20http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n11http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n9http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n10http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n4http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n18http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F68407700%3A21340%2F13%3A00215709%21RIV14-MSM-21340___
rdf:type
skos:Concept n5:Vysledek
rdfs:seeAlso
http://www.epj-conferences.org/articles/epjconf/pdf/2013/09/epjconf_OAM2012_00023.pdf
dcterms:description
In this paper, a laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large area is exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strong demagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared. The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned. In this paper, a laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large area is exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strong demagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared. The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned.
dcterms:title
Fabrication of diffractive elements using matrix laser lithography Fabrication of diffractive elements using matrix laser lithography
skos:prefLabel
Fabrication of diffractive elements using matrix laser lithography Fabrication of diffractive elements using matrix laser lithography
skos:notation
RIV/68407700:21340/13:00215709!RIV14-MSM-21340___
n5:predkladatel
n6:orjk%3A21340
n3:aktivita
n9:P n9:I
n3:aktivity
I, P(KAN401220801)
n3:cisloPeriodika
48
n3:dodaniDat
n18:2014
n3:domaciTvurceVysledku
n12:8789088 Škereň, Marek n12:1881825 n12:4965841
n3:druhVysledku
n10:J
n3:duvernostUdaju
n20:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
74489
n3:idVysledku
RIV/68407700:21340/13:00215709
n3:jazykVysledku
n11:eng
n3:klicovaSlova
diffractive optics; matrix laser lithography
n3:klicoveSlovo
n17:matrix%20laser%20lithography n17:diffractive%20optics
n3:kodStatuVydavatele
FR - Francouzská republika
n3:kontrolniKodProRIV
[8E146C9C0F13]
n3:nazevZdroje
EPJ Web of Conferences
n3:obor
n4:JA
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n15:KAN401220801
n3:rokUplatneniVysledku
n18:2013
n3:svazekPeriodika
48
n3:tvurceVysledku
Svoboda, Jakub Škereň, Marek Květoň, Milan Fiala, Pavel
n3:wos
000326985500022
s:issn
2100-014X
s:numberOfPages
5
n21:doi
10.1051/epjconf/20134800023
n16:organizacniJednotka
21340