This HTML5 document contains 46 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
n4http://linked.opendata.cz/ontology/domain/vavai/riv/typAkce/
dctermshttp://purl.org/dc/terms/
n8http://purl.org/net/nknouf/ns/bibtex#
n7http://localhost/temp/predkladatel/
n21http://linked.opendata.cz/resource/domain/vavai/projekt/
n10http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n13http://linked.opendata.cz/resource/domain/vavai/subjekt/
n12http://linked.opendata.cz/ontology/domain/vavai/
n17https://schema.org/
shttp://schema.org/
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n5http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F68407700%3A21340%2F12%3A00203989%21RIV13-AV0-21340___/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n14http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n11http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n22http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n6http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n20http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n18http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n16http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F68407700%3A21340%2F12%3A00203989%21RIV13-AV0-21340___
rdf:type
skos:Concept n12:Vysledek
dcterms:description
A laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large area is exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strong demagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared. The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned. A laser writing technique for fabrication of diffractive and photonic structures is presented, which is based on a computer driven matrix exposure of a recording material. In contrast to the commonly used laser writing techniques, a relatively large area is exposed within a single exposure step, which ensures a high speed of the writing process. The exposed micro-structure is projected from a computer driven spatial light modulator with high resolution on a recording material with strong demagnification. The mechanically passive projection ensures high precision of the writing process, which is limited only by the Rayleigh diffraction limit. When multiple exposures of the same area are used, complicated micro-structures can be prepared. The device constructed on the described basis will be presented together with different samples prepared using this technology. Selected applications of the elements will be also mentioned.
dcterms:title
Fabrication of synthetic diffractive elements using advanced matrix laser lithography Fabrication of synthetic diffractive elements using advanced matrix laser lithography
skos:prefLabel
Fabrication of synthetic diffractive elements using advanced matrix laser lithography Fabrication of synthetic diffractive elements using advanced matrix laser lithography
skos:notation
RIV/68407700:21340/12:00203989!RIV13-AV0-21340___
n12:predkladatel
n13:orjk%3A21340
n3:aktivita
n6:P
n3:aktivity
P(KAN401220801)
n3:dodaniDat
n16:2013
n3:domaciTvurceVysledku
n10:8789088 n10:1881825 Škereň, Marek n10:4965841
n3:druhVysledku
n20:D
n3:duvernostUdaju
n11:S
n3:entitaPredkladatele
n5:predkladatel
n3:idSjednocenehoVysledku
135995
n3:idVysledku
RIV/68407700:21340/12:00203989
n3:jazykVysledku
n22:eng
n3:klicovaSlova
laser lithography; matrlix laser lithography; photonic micro-structures
n3:klicoveSlovo
n14:laser%20lithography n14:photonic%20micro-structures n14:matrlix%20laser%20lithography
n3:kontrolniKodProRIV
[784D52F0EDA6]
n3:mistoKonaniAkce
Liberec
n3:mistoVydani
Prague
n3:nazevZdroje
Conference Proceedings - Optics and Measurement International conference 2012
n3:obor
n18:BH
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n21:KAN401220801
n3:rokUplatneniVysledku
n16:2012
n3:tvurceVysledku
Fiala, Pavel Svoboda, Jakub Škereň, Marek Květoň, Milan
n3:typAkce
n4:EUR
n3:zahajeniAkce
2012-10-16+02:00
s:numberOfPages
5
n8:hasPublisher
Ústav fyziky plazmatu AV ČR
n17:isbn
978-80-87026-02-1
n7:organizacniJednotka
21340