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Statements

Subject Item
n2:RIV%2F68407700%3A21340%2F09%3A00166854%21RIV10-MSM-21340___
rdf:type
n12:Vysledek skos:Concept
dcterms:description
The LuAG:Ce scintillator films prepared using a liquid phase epitaxy can be used for 2D X-ray-imaging with high resolution. The aim of this paper is to study and characterize scintillation and optical properties of the LuAG:Ce garnet epitaxial films grown using two different fluxes: PbO-B2O3 and BaO-B2O3-BaF2. The scintillation response was measured under alpha-particle excitation, photoelectron yield, its' dependence on shaping time of an amplifier, and FWHM was evaluated and compared. Influence of flux composition on response is discussed. The LuAG:Ce scintillator films prepared using a liquid phase epitaxy can be used for 2D X-ray-imaging with high resolution. The aim of this paper is to study and characterize scintillation and optical properties of the LuAG:Ce garnet epitaxial films grown using two different fluxes: PbO-B2O3 and BaO-B2O3-BaF2. The scintillation response was measured under alpha-particle excitation, photoelectron yield, its' dependence on shaping time of an amplifier, and FWHM was evaluated and compared. Influence of flux composition on response is discussed.
dcterms:title
Scintillation Properties of LuAG:Ce Single Crystalline Films Grown by LPE Method Scintillation Properties of LuAG:Ce Single Crystalline Films Grown by LPE Method
skos:prefLabel
Scintillation Properties of LuAG:Ce Single Crystalline Films Grown by LPE Method Scintillation Properties of LuAG:Ce Single Crystalline Films Grown by LPE Method
skos:notation
RIV/68407700:21340/09:00166854!RIV10-MSM-21340___
n3:aktivita
n9:Z n9:P
n3:aktivity
P(GA202/08/0893), Z(MSM0021620834), Z(MSM6840770040)
n3:dodaniDat
n5:2010
n3:domaciTvurceVysledku
n17:8896054
n3:druhVysledku
n22:D
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n20:predkladatel
n3:idSjednocenehoVysledku
340380
n3:idVysledku
RIV/68407700:21340/09:00166854
n3:jazykVysledku
n18:eng
n3:klicovaSlova
LuAG:Ce; LiquidPhase Epitaxy; Scintillator; Photoelectron Yield; FWHM; Alpha-Particle Excitation
n3:klicoveSlovo
n4:Photoelectron%20Yield n4:FWHM n4:LuAG%3ACe n4:LiquidPhase%20Epitaxy n4:Alpha-Particle%20Excitation n4:Scintillator
n3:kontrolniKodProRIV
[A24D16522C0B]
n3:mistoKonaniAkce
Pisa
n3:mistoVydani
Pisa
n3:nazevZdroje
Conference Proceedings of the 5th International Symposium on Laser, Scintilator and Non Linear Optical Materials
n3:obor
n15:BG
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
5
n3:projekt
n19:GA202%2F08%2F0893
n3:rokUplatneniVysledku
n5:2009
n3:tvurceVysledku
Průša, Petr
n3:typAkce
n21:WRD
n3:zahajeniAkce
2009-09-03+02:00
n3:zamer
n7:MSM0021620834 n7:MSM6840770040
s:numberOfPages
1
n11:hasPublisher
Edizioni Plus - Universita di Pisa
n14:isbn
978-88-8492-638-8
n8:organizacniJednotka
21340