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Statements

Subject Item
n2:RIV%2F68407700%3A21230%2F14%3A00225012%21RIV15-MSM-21230___
rdf:type
n9:Vysledek skos:Concept
rdfs:seeAlso
http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-22-25-31466
dcterms:description
The thin-film limit is derived by a nonconventional approach and equations for transmittance, reflectance and absorptance are presented in highly versatile and accurate form. In the thin-film limit the optical properties do not depend on the absorption coefficient, thickness and refractive index individually, but only on their product. We show that this formalism is applicable to the problem of ultrathin defective layer e.g. on a top of a layer of amorphous silicon. We develop a new method of direct evaluation of the surface defective layer and the bulk defects. Applying this method to amorphous silicon on glass, we show that the surface defective layer differs from bulk amorphous silicon in terms of light soaking. The thin-film limit is derived by a nonconventional approach and equations for transmittance, reflectance and absorptance are presented in highly versatile and accurate form. In the thin-film limit the optical properties do not depend on the absorption coefficient, thickness and refractive index individually, but only on their product. We show that this formalism is applicable to the problem of ultrathin defective layer e.g. on a top of a layer of amorphous silicon. We develop a new method of direct evaluation of the surface defective layer and the bulk defects. Applying this method to amorphous silicon on glass, we show that the surface defective layer differs from bulk amorphous silicon in terms of light soaking.
dcterms:title
Thin-film limit formalism applied to surface defect absorption Thin-film limit formalism applied to surface defect absorption
skos:prefLabel
Thin-film limit formalism applied to surface defect absorption Thin-film limit formalism applied to surface defect absorption
skos:notation
RIV/68407700:21230/14:00225012!RIV15-MSM-21230___
n4:aktivita
n17:P n17:I n17:V
n4:aktivity
I, P(7E12029), P(GA14-05053S), V
n4:cisloPeriodika
25
n4:dodaniDat
n11:2015
n4:domaciTvurceVysledku
n20:8660565
n4:druhVysledku
n14:J
n4:duvernostUdaju
n18:S
n4:entitaPredkladatele
n7:predkladatel
n4:idSjednocenehoVysledku
50433
n4:idVysledku
RIV/68407700:21230/14:00225012
n4:jazykVysledku
n6:eng
n4:klicovaSlova
thin films; optical properties; absorption
n4:klicoveSlovo
n12:optical%20properties n12:absorption n12:thin%20films
n4:kodStatuVydavatele
US - Spojené státy americké
n4:kontrolniKodProRIV
[DF6A282B8F24]
n4:nazevZdroje
Optics Express
n4:obor
n5:BH
n4:pocetDomacichTvurcuVysledku
1
n4:pocetTvurcuVysledku
2
n4:projekt
n15:7E12029 n15:GA14-05053S
n4:rokUplatneniVysledku
n11:2014
n4:svazekPeriodika
22
n4:tvurceVysledku
Ballif, C. Holovský, Jakub
n4:wos
000346368800141
s:issn
1094-4087
s:numberOfPages
7
n16:doi
10.1364/OE.22.031466
n13:organizacniJednotka
21230