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Statements

Subject Item
n2:RIV%2F68407700%3A21230%2F14%3A00218795%21RIV15-GA0-21230___
rdf:type
skos:Concept n13:Vysledek
rdfs:seeAlso
http://przyrbwn.icm.edu.pl/APP/PDF/126/a126z1p071.pdf
dcterms:description
In this paper we study the influence of the roughness of the copper substrate on the magnetic properties of the FeNi film we electroplate onto it. The roughness and the thickness of the copper substrate are reduced by electropolishing in orthophosphoric acid: we show how to select the working point, which gives the highest smoothness, avoiding defects due to gas evolution. Finally we show how a smoother substrate contributes to reducing the coercivity of the magnetic film grown on it. In this paper we study the influence of the roughness of the copper substrate on the magnetic properties of the FeNi film we electroplate onto it. The roughness and the thickness of the copper substrate are reduced by electropolishing in orthophosphoric acid: we show how to select the working point, which gives the highest smoothness, avoiding defects due to gas evolution. Finally we show how a smoother substrate contributes to reducing the coercivity of the magnetic film grown on it.
dcterms:title
Fine Smoothing of Conductive Substrate for Permalloy Layer Electroplating Fine Smoothing of Conductive Substrate for Permalloy Layer Electroplating
skos:prefLabel
Fine Smoothing of Conductive Substrate for Permalloy Layer Electroplating Fine Smoothing of Conductive Substrate for Permalloy Layer Electroplating
skos:notation
RIV/68407700:21230/14:00218795!RIV15-GA0-21230___
n3:aktivita
n16:P
n3:aktivity
P(GAP102/12/2177)
n3:cisloPeriodika
1
n3:dodaniDat
n7:2015
n3:domaciTvurceVysledku
Butta, Mattia n18:3157644 n18:4718267
n3:druhVysledku
n17:J
n3:duvernostUdaju
n10:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
16872
n3:idVysledku
RIV/68407700:21230/14:00218795
n3:jazykVysledku
n4:eng
n3:klicovaSlova
electropolishing; permalloy; thin film
n3:klicoveSlovo
n6:permalloy n6:thin%20film n6:electropolishing
n3:kodStatuVydavatele
PL - Polská republika
n3:kontrolniKodProRIV
[9412421D47E6]
n3:nazevZdroje
Acta Physica Polonica A
n3:obor
n11:JB
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
4
n3:projekt
n15:GAP102%2F12%2F2177
n3:rokUplatneniVysledku
n7:2014
n3:svazekPeriodika
126
n3:tvurceVysledku
Janošek, Michal Kraus, L. Butta, Mattia Pilarčíková, Ivana
n3:wos
000339833100072
s:issn
0587-4246
s:numberOfPages
2
n20:doi
10.12693/APhysPolA.126.150
n5:organizacniJednotka
21230