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Namespace Prefixes

PrefixIRI
n16http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F68407700%3A21230%2F11%3A00180879%21RIV12-MSM-21230___/
dctermshttp://purl.org/dc/terms/
n17http://localhost/temp/predkladatel/
n18http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n8http://linked.opendata.cz/resource/domain/vavai/subjekt/
n7http://linked.opendata.cz/ontology/domain/vavai/
n15http://linked.opendata.cz/resource/domain/vavai/zamer/
shttp://schema.org/
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n11http://bibframe.org/vocab/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n12http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n20http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n14http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n5http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n19http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n10http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n9http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F68407700%3A21230%2F11%3A00180879%21RIV12-MSM-21230___
rdf:type
skos:Concept n7:Vysledek
dcterms:description
CrAlN, CrAlSiN and AlCrSiN coatings were deposited by cathodic arc deposition technique from composite targets. Three targets were used: i) Cr/Al ratio close to 1, ii) Cr/Al ratio close to 1 with Si addition, and iii) Cr/Al ratio close to 1/2 and Si addition. Nitrogen flow was kept constant during the depositions. The Cr/Al ratio of the films, measured by electron probe microanalysis (EPMA), was similar to that of the target and the silicon content was in the range 3-4 at.%. CrAlN, CrAlSiN and AlCrSiN coatings were deposited by cathodic arc deposition technique from composite targets. Three targets were used: i) Cr/Al ratio close to 1, ii) Cr/Al ratio close to 1 with Si addition, and iii) Cr/Al ratio close to 1/2 and Si addition. Nitrogen flow was kept constant during the depositions. The Cr/Al ratio of the films, measured by electron probe microanalysis (EPMA), was similar to that of the target and the silicon content was in the range 3-4 at.%.
dcterms:title
High temperature properties of CrAlN, CrAlSiN and AlCrSiN coatings - Structure and oxidation High temperature properties of CrAlN, CrAlSiN and AlCrSiN coatings - Structure and oxidation
skos:prefLabel
High temperature properties of CrAlN, CrAlSiN and AlCrSiN coatings - Structure and oxidation High temperature properties of CrAlN, CrAlSiN and AlCrSiN coatings - Structure and oxidation
skos:notation
RIV/68407700:21230/11:00180879!RIV12-MSM-21230___
n7:predkladatel
n8:orjk%3A21230
n3:aktivita
n5:Z
n3:aktivity
Z(MSM6840770038)
n3:cisloPeriodika
1-2
n3:dodaniDat
n9:2012
n3:domaciTvurceVysledku
n18:8570256
n3:druhVysledku
n10:J
n3:duvernostUdaju
n20:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
202042
n3:idVysledku
RIV/68407700:21230/11:00180879
n3:jazykVysledku
n14:eng
n3:klicovaSlova
Thin films; Oxidation; Diffusion
n3:klicoveSlovo
n12:Thin%20films n12:Oxidation n12:Diffusion
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[53DEF2EF6109]
n3:nazevZdroje
Materials Chemistry and Physics
n3:obor
n19:JI
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
2
n3:rokUplatneniVysledku
n9:2011
n3:svazekPeriodika
129
n3:tvurceVysledku
Cavaleiro, A. Polcar, Tomáš
n3:wos
000292621200033
n3:zamer
n15:MSM6840770038
s:issn
0254-0584
s:numberOfPages
7
n11:doi
10.1016/j.matchemphys.2011.03.078
n17:organizacniJednotka
21230