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Statements

Subject Item
n2:RIV%2F68407700%3A21230%2F10%3A00172731%21RIV11-GA0-21230___
rdf:type
n14:Vysledek skos:Concept
dcterms:description
Micro-sized patterns were created on oligomer (Su-8) films by the effect of external electric field, perpendicular to the film surface. Structures with varying parameters were prepared and the growth of continuous or dot-like structures was observed. The mechanism dominating the structure growth was examined and found to be a function of experimental conditions. The dependence of the form and the size of the created patterns on the intensity of the electric field, exposure time and initial distance between mask and polymer surface was investigated. Waveguiding properties of the linear pattern, produced by the above technique, were examined and the following parameters were obtained: propagation loss - 2-3 dB/cm, effective refractive index - 1.6276, number of supported modes - 30). Micro-sized patterns were created on oligomer (Su-8) films by the effect of external electric field, perpendicular to the film surface. Structures with varying parameters were prepared and the growth of continuous or dot-like structures was observed. The mechanism dominating the structure growth was examined and found to be a function of experimental conditions. The dependence of the form and the size of the created patterns on the intensity of the electric field, exposure time and initial distance between mask and polymer surface was investigated. Waveguiding properties of the linear pattern, produced by the above technique, were examined and the following parameters were obtained: propagation loss - 2-3 dB/cm, effective refractive index - 1.6276, number of supported modes - 30).
dcterms:title
Preparation of rib channel waveguides on polymer in electric field Preparation of rib channel waveguides on polymer in electric field
skos:prefLabel
Preparation of rib channel waveguides on polymer in electric field Preparation of rib channel waveguides on polymer in electric field
skos:notation
RIV/68407700:21230/10:00172731!RIV11-GA0-21230___
n3:aktivita
n15:S n15:P n15:Z
n3:aktivity
P(GP102/09/P104), P(KAN400480701), P(LC06041), S, Z(AV0Z10480505), Z(MSM6046137302), Z(MSM6840770014)
n3:cisloPeriodika
4
n3:dodaniDat
n9:2011
n3:domaciTvurceVysledku
n17:3520196
n3:druhVysledku
n12:J
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
281384
n3:idVysledku
RIV/68407700:21230/10:00172731
n3:jazykVysledku
n13:eng
n3:klicovaSlova
Epoxy novolak resin; Optical waveguide; Optical properties
n3:klicoveSlovo
n8:Optical%20properties n8:Epoxy%20novolak%20resin n8:Optical%20waveguide
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[4101CB4E5518]
n3:nazevZdroje
Thin Solid Films
n3:obor
n11:JA
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
6
n3:projekt
n5:KAN400480701 n5:LC06041 n5:GP102%2F09%2FP104
n3:rokUplatneniVysledku
n9:2010
n3:svazekPeriodika
519
n3:tvurceVysledku
Lyutakov, O. Prajzler, Václav Švorčík, Václav Hnatowicz, V. Tuma, J. Hüttel, Ivan
n3:zamer
n10:AV0Z10480505 n10:MSM6046137302 n10:MSM6840770014
s:issn
0040-6090
s:numberOfPages
6
n6:organizacniJednotka
21230