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Statements

Subject Item
n2:RIV%2F68407700%3A21230%2F09%3A00159888%21RIV10-MSM-21230___
rdf:type
n12:Vysledek skos:Concept
dcterms:description
The work is focused on investigation of properties of thin film layer in dependence on deposition process. The work is focused on investigation of properties of thin film layer in dependence on deposition process.
dcterms:title
The Sputtered Dielectric Thin Film Layer and Their Properties The Sputtered Dielectric Thin Film Layer and Their Properties
skos:prefLabel
The Sputtered Dielectric Thin Film Layer and Their Properties The Sputtered Dielectric Thin Film Layer and Their Properties
skos:notation
RIV/68407700:21230/09:00159888!RIV10-MSM-21230___
n3:aktivita
n13:Z
n3:aktivity
Z(MSM6840770021)
n3:dodaniDat
n10:2010
n3:domaciTvurceVysledku
n19:7634773
n3:druhVysledku
n21:D
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
343171
n3:idVysledku
RIV/68407700:21230/09:00159888
n3:jazykVysledku
n11:eng
n3:klicovaSlova
Dielectric Thin Film Layer; Reactive sputtering
n3:klicoveSlovo
n5:Reactive%20sputtering n5:Dielectric%20Thin%20Film%20Layer
n3:kontrolniKodProRIV
[3E280078B3C4]
n3:mistoKonaniAkce
Brno
n3:mistoVydani
Brno
n3:nazevZdroje
32nd ISSE 2009 Proceedings
n3:obor
n6:JA
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
2
n3:rokUplatneniVysledku
n10:2009
n3:tvurceVysledku
Beshajová Pelikánová, Ivana
n3:typAkce
n4:EUR
n3:zahajeniAkce
2009-05-13+02:00
n3:zamer
n17:MSM6840770021
s:numberOfPages
4
n20:hasPublisher
Vysoké učení technické v Brně. Fakulta elektrotechniky a informatiky
n16:isbn
978-1-4244-4260-7
n8:organizacniJednotka
21230