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Namespace Prefixes

PrefixIRI
n19http://linked.opendata.cz/ontology/domain/vavai/riv/typAkce/
dctermshttp://purl.org/dc/terms/
n17http://purl.org/net/nknouf/ns/bibtex#
n13http://localhost/temp/predkladatel/
n22http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n10http://linked.opendata.cz/resource/domain/vavai/projekt/
n9http://linked.opendata.cz/ontology/domain/vavai/
n21http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F68407700%3A21230%2F09%3A00158523%21RIV11-MSM-21230___/
n20https://schema.org/
n6http://linked.opendata.cz/resource/domain/vavai/zamer/
shttp://schema.org/
n5http://linked.opendata.cz/ontology/domain/vavai/riv/
skoshttp://www.w3.org/2004/02/skos/core#
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n11http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n8http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n14http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n12http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n18http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n15http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n7http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F68407700%3A21230%2F09%3A00158523%21RIV11-MSM-21230___
rdf:type
n9:Vysledek skos:Concept
dcterms:description
The local anodic oxidation (LAO) by the atomic force microscope (AFM) in the AC mode could be a good alternative to standard lithographic techniques especially for the device patterning in the nanometer scale at laboratory conditions. In the combination with EBL the nanostructures with the resolution of a few tenths of nanometers could be prepared in a very fast and efficient way. The local anodic oxidation (LAO) by the atomic force microscope (AFM) in the AC mode could be a good alternative to standard lithographic techniques especially for the device patterning in the nanometer scale at laboratory conditions. In the combination with EBL the nanostructures with the resolution of a few tenths of nanometers could be prepared in a very fast and efficient way.
dcterms:title
Nanoelectronics and nanolithography Nanoelectronics and nanolithography
skos:prefLabel
Nanoelectronics and nanolithography Nanoelectronics and nanolithography
skos:notation
RIV/68407700:21230/09:00158523!RIV11-MSM-21230___
n5:aktivita
n12:Z n12:P
n5:aktivity
P(KAN400100652), Z(MSM6840770014)
n5:dodaniDat
n7:2011
n5:domaciTvurceVysledku
n22:7815476
n5:druhVysledku
n18:D
n5:duvernostUdaju
n8:S
n5:entitaPredkladatele
n21:predkladatel
n5:idSjednocenehoVysledku
328408
n5:idVysledku
RIV/68407700:21230/09:00158523
n5:jazykVysledku
n14:eng
n5:klicovaSlova
nanolithography; local anodic oxidation; atomic force microscopy
n5:klicoveSlovo
n11:nanolithography n11:local%20anodic%20oxidation n11:atomic%20force%20microscopy
n5:kontrolniKodProRIV
[BF6D869D887B]
n5:mistoKonaniAkce
Rožnov pod Radhoštěm
n5:mistoVydani
Ostrava
n5:nazevZdroje
Nanocon 2009 Conference Proceedings
n5:obor
n15:JA
n5:pocetDomacichTvurcuVysledku
1
n5:pocetTvurcuVysledku
1
n5:projekt
n10:KAN400100652
n5:rokUplatneniVysledku
n7:2009
n5:tvurceVysledku
Voves, Jan
n5:typAkce
n19:EUR
n5:zahajeniAkce
2009-10-20+02:00
n5:zamer
n6:MSM6840770014
s:numberOfPages
8
n17:hasPublisher
TANGER, spol.s r.o
n20:isbn
978-80-87294-13-0
n13:organizacniJednotka
21230