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Statements

Subject Item
n2:RIV%2F68407700%3A21230%2F08%3A06145482%21RIV09-MSM-21230___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
The conventional and RGPP process parameters (target potential, total pressure and deposition rate) and the corresponding chemical composition were used to build a simple model predicting the deposition rate and the average chemical composition of the coatings deposited by RGPP as a function of the pulsing parameters. It was shown that the measured total pressure could be used to calculate the deposition rate and the chemical composition of the RGPP coatings with reasonable precision. The conventional and RGPP process parameters (target potential, total pressure and deposition rate) and the corresponding chemical composition were used to build a simple model predicting the deposition rate and the average chemical composition of the coatings deposited by RGPP as a function of the pulsing parameters. It was shown that the measured total pressure could be used to calculate the deposition rate and the chemical composition of the RGPP coatings with reasonable precision. Jednoduchy model pro depozici W-O vrstev reaktivnim magnetronovym naprasovanim s pulsovanim kysliku.
dcterms:title
A simple model for the deposition of W-O coatings by reactive gas pulsing process A simple model for the deposition of W-O coatings by reactive gas pulsing process Jednoduchy model pro depozici W-O vrstev magnetronovym naprasovanim s pulzovanim reaktivniho plynu
skos:prefLabel
A simple model for the deposition of W-O coatings by reactive gas pulsing process Jednoduchy model pro depozici W-O vrstev magnetronovym naprasovanim s pulzovanim reaktivniho plynu A simple model for the deposition of W-O coatings by reactive gas pulsing process
skos:notation
RIV/68407700:21230/08:06145482!RIV09-MSM-21230___
n3:aktivita
n13:Z
n3:aktivity
Z(MSM6840770038)
n3:cisloPeriodika
3
n3:dodaniDat
n10:2009
n3:domaciTvurceVysledku
n7:8570256
n3:druhVysledku
n15:J
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n11:predkladatel
n3:idSjednocenehoVysledku
354508
n3:idVysledku
RIV/68407700:21230/08:06145482
n3:jazykVysledku
n16:eng
n3:klicovaSlova
multilayer; reactive gas pulsing; sputtering; tungsten oxide
n3:klicoveSlovo
n12:multilayer n12:tungsten%20oxide n12:sputtering n12:reactive%20gas%20pulsing
n3:kodStatuVydavatele
FR - Francouzská republika
n3:kontrolniKodProRIV
[C1532F925D41]
n3:nazevZdroje
The European Physical Journal Applied Physics
n3:obor
n18:JI
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
4
n3:rokUplatneniVysledku
n10:2008
n3:svazekPeriodika
43
n3:tvurceVysledku
Carvalho, N.J.M. Cavaleiro, A. Polcar, Tomáš Parreira, N. M. G.
n3:wos
000258652300010
n3:zamer
n17:MSM6840770038
s:issn
1286-0042
s:numberOfPages
5
n4:organizacniJednotka
21230