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Statements

Subject Item

n2:RIV%2F68407700%3A21230%2F06%3A00167865%21RIV11-MSM-21230___

rdf:type

skos:Concept n11:Vysledek

dcterms:description

Technology of factorial experiments is used for simulation of evaporation of thin Ni films. Evaporated structures were examined from the point of view of the resistance and their thickness. Technology of factorial experiments is used for simulation of evaporation of thin Ni films. Evaporated structures were examined from the point of view of the resistance and their thickness.

dcterms:title

Modeling of Evaporation of Thin Films Using DOE Modeling of Evaporation of Thin Films Using DOE

skos:prefLabel

Modeling of Evaporation of Thin Films Using DOE Modeling of Evaporation of Thin Films Using DOE

skos:notation

RIV/68407700:21230/06:00167865!RIV11-MSM-21230___

n3:aktivita

n16:Z

n3:aktivity

Z(MSM6840770021)

n3:dodaniDat

n17:2011

n3:domaciTvurceVysledku

n8:9716254

n3:druhVysledku

n6:D

n3:duvernostUdaju

n14:S

n3:entitaPredkladatele

n13:predkladatel

n3:idSjednocenehoVysledku

486160

n3:idVysledku

RIV/68407700:21230/06:00167865

n3:jazykVysledku

n4:eng

n3:klicovaSlova

Evaporation; DOE; Thickness

n3:klicoveSlovo

n19:Evaporation n19:DOE n19:Thickness

n3:kontrolniKodProRIV

[8CAD58F9D420]

n3:mistoKonaniAkce

St. Marienthal

n3:mistoVydani

New York

n3:nazevZdroje

29th International Spring Seminar on Electronics Technology

n3:obor

n15:JA

n3:pocetDomacichTvurcuVysledku

1

n3:pocetTvurcuVysledku

2

n3:rokUplatneniVysledku

n17:2006

n3:tvurceVysledku

Mach, Pavel Kocián, M.

n3:typAkce

n5:WRD

n3:wos

000246825800045

n3:zahajeniAkce

2006-05-10+02:00

n3:zamer

n12:MSM6840770021

s:numberOfPages

5

n21:hasPublisher

IEEE

n7:isbn

978-1-4244-0550-3

n20:organizacniJednotka

21230