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Statements

Subject Item
n2:RIV%2F68407700%3A21220%2F01%3A02066002%21RIV%2F2004%2FAV0%2F212204%2FN
rdf:type
skos:Concept n9:Vysledek
dcterms:description
The paper presents final theoretical results on modeling of a Thermal Plasma System for Chemical Vapor Deposition. Laminar description is substituted by turbulent description and remaining discrepancies with experiments are discussed. The paper presents final theoretical results on modeling of a Thermal Plasma System for Chemical Vapor Deposition. Laminar description is substituted by turbulent description and remaining discrepancies with experiments are discussed.
dcterms:title
Analysis of a Thermal Plasma Diamond CVD System Analysis of a Thermal Plasma Diamond CVD System
skos:prefLabel
Analysis of a Thermal Plasma Diamond CVD System Analysis of a Thermal Plasma Diamond CVD System
skos:notation
RIV/68407700:21220/01:02066002!RIV/2004/AV0/212204/N
n3:strany
295 ; 299
n3:aktivita
n12:P
n3:aktivity
P(IAA1057001)
n3:dodaniDat
n13:2004
n3:domaciTvurceVysledku
n4:6469124
n3:druhVysledku
n18:D
n3:duvernostUdaju
n8:S
n3:entitaPredkladatele
n20:predkladatel
n3:idSjednocenehoVysledku
673065
n3:idVysledku
RIV/68407700:21220/01:02066002
n3:jazykVysledku
n16:eng
n3:klicovaSlova
Chemical Vapor Deposition;Thermal Plasma;modeling
n3:klicoveSlovo
n11:Chemical%20Vapor%20Deposition n11:modeling n11:Thermal%20Plasma
n3:kontrolniKodProRIV
[149D71DDA9F1]
n3:mistoKonaniAkce
Glasgow
n3:mistoVydani
Glasgow
n3:nazevZdroje
Proceedings of International Conference on Advanced Engineering Design
n3:obor
n7:BK
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
1
n3:projekt
n19:IAA1057001
n3:rokUplatneniVysledku
n13:2001
n3:tvurceVysledku
Kolman, David
n3:typAkce
n17:WRD
n3:zahajeniAkce
2001-06-24+02:00
s:numberOfPages
5
n5:hasPublisher
University of Glasgow
n10:isbn
0-85261-731-3
n15:organizacniJednotka
21220