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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F99%3A02000057%21RIV%2F2003%2FAV0%2FA02003%2FN
rdf:type
skos:Concept n18:Vysledek
dcterms:description
The composition, optical and mechanical propertiesf the CNxHy films deposited at various process conditions were investigated by electron microprobe analysis, IR spectroscopy and microhardness measurements. The composition, optical and mechanical propertiesf the CNxHy films deposited at various process conditions were investigated by electron microprobe analysis, IR spectroscopy and microhardness measurements.
dcterms:title
CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism. CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism.
skos:prefLabel
CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism. CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism.
skos:notation
RIV/68378271:_____/99:02000057!RIV/2003/AV0/A02003/N
n3:strany
65;73
n3:aktivita
n14:Z n14:P
n3:aktivity
P(IAA1010827), Z(AV0Z1010914)
n3:cisloPeriodika
N/A
n3:dodaniDat
n5:2003
n3:domaciTvurceVysledku
n7:9269606 n7:6321445 n7:5193222 n7:2899841
n3:druhVysledku
n15:J
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
737012
n3:idVysledku
RIV/68378271:_____/99:02000057
n3:jazykVysledku
n17:eng
n3:klicovaSlova
N/A
n3:klicoveSlovo
n16:N%2FA
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[1D608FF575BC]
n3:nazevZdroje
Surface and Coatings Technology
n3:obor
n11:BM
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
6
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:projekt
n4:IAA1010827
n3:rokUplatneniVysledku
n5:1999
n3:svazekPeriodika
116/119
n3:tvurceVysledku
Soukup, Ladislav Musil, Jindřich Jastrabík, Lubomír Fendrych, František Shaginyan, L. R. Kulikovsky, V. Yu.
n3:zamer
n6:AV0Z1010914
s:issn
0257-8972
s:numberOfPages
9