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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F14%3A00432632%21RIV15-GA0-68378271
rdf:type
n17:Vysledek skos:Concept
dcterms:description
In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture. In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture.
dcterms:title
Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching
skos:prefLabel
Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching
skos:notation
RIV/68378271:_____/14:00432632!RIV15-GA0-68378271
n3:aktivita
n18:P n18:I
n3:aktivity
I, P(FR-TI2/736), P(GAP108/12/0910), P(GAP108/12/0996)
n3:cisloPeriodika
7
n3:dodaniDat
n11:2015
n3:domaciTvurceVysledku
n4:5635853 n4:7465416 n4:8770026 n4:6031285 Babchenko, Oleg Ižák, Tibor
n3:druhVysledku
n15:J
n3:duvernostUdaju
n6:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
27496
n3:idVysledku
RIV/68378271:_____/14:00432632
n3:jazykVysledku
n12:eng
n3:klicovaSlova
micro- and nanocrystalline diamond; capacitively coupled plasma; reactive ion etching; nanostructuring; scanning electron microscopy
n3:klicoveSlovo
n5:micro-%20and%20nanocrystalline%20diamond n5:reactive%20ion%20etching n5:scanning%20electron%20microscopy n5:nanostructuring n5:capacitively%20coupled%20plasma
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[4D86A5CD1CBD]
n3:nazevZdroje
Advanced Science, Engineering and Medicine
n3:obor
n9:BM
n3:pocetDomacichTvurcuVysledku
6
n3:pocetTvurcuVysledku
6
n3:projekt
n8:GAP108%2F12%2F0910 n8:FR-TI2%2F736 n8:GAP108%2F12%2F0996
n3:rokUplatneniVysledku
n11:2014
n3:svazekPeriodika
6
n3:tvurceVysledku
Domonkos, Mária Hruška, Karel Ižák, Tibor Kromka, Alexander Babchenko, Oleg Varga, Marián
s:issn
2164-6627
s:numberOfPages
5
n14:doi
10.1166/asem.2014.1573