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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F13%3A00421856%21RIV14-MSM-68378271
rdf:type
skos:Concept n13:Vysledek
rdfs:seeAlso
http://www.sciencedirect.com/science/article/pii/S0040609013011127
dcterms:description
The high power impulse magnetron sputtering deposition system (HiPIMS) equipped with 5 cm in diameter titanium target has been investigated by means of time-resolved modified Katsumata probe. The probe allows for determination of the ion velocity distribution function. Compact construction of modified Katsumata probe allows us to place the probe in an arbitrary position with respect to planar magnetron. The present construction of modified Katsumata probe allows reaching the acceptance angle of about 15°. The ion velocity distribution function (IVDF) in forward direction is then directly proportional to the derivative of measured ion current with respect to the retarding potential. An angle-resolved study of HiPIMS system operating in the reactive atmosphere has been carried out. The effect of oxygen partial pressure on measured IVDF at different angles within the plasma pulse has been investigated. The high power impulse magnetron sputtering deposition system (HiPIMS) equipped with 5 cm in diameter titanium target has been investigated by means of time-resolved modified Katsumata probe. The probe allows for determination of the ion velocity distribution function. Compact construction of modified Katsumata probe allows us to place the probe in an arbitrary position with respect to planar magnetron. The present construction of modified Katsumata probe allows reaching the acceptance angle of about 15°. The ion velocity distribution function (IVDF) in forward direction is then directly proportional to the derivative of measured ion current with respect to the retarding potential. An angle-resolved study of HiPIMS system operating in the reactive atmosphere has been carried out. The effect of oxygen partial pressure on measured IVDF at different angles within the plasma pulse has been investigated.
dcterms:title
Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system
skos:prefLabel
Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system
skos:notation
RIV/68378271:_____/13:00421856!RIV14-MSM-68378271
n13:predkladatel
n14:ico%3A68378271
n3:aktivita
n16:I n16:P
n3:aktivity
I, P(LD12002)
n3:cisloPeriodika
DEC
n3:dodaniDat
n4:2014
n3:domaciTvurceVysledku
n5:2296268 n5:9773185 n5:9254927 n5:4267281 n5:2989034
n3:druhVysledku
n15:J
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n12:predkladatel
n3:idSjednocenehoVysledku
61256
n3:idVysledku
RIV/68378271:_____/13:00421856
n3:jazykVysledku
n11:eng
n3:klicovaSlova
HiPIMS; titania; Katsumata probe; ion sensitive probe; IVDF; angular resolution
n3:klicoveSlovo
n9:IVDF n9:angular%20resolution n9:ion%20sensitive%20probe n9:HiPIMS n9:titania n9:Katsumata%20probe
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[F9C248FDE44C]
n3:nazevZdroje
Thin Solid Films
n3:obor
n7:BL
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
7
n3:projekt
n20:LD12002
n3:rokUplatneniVysledku
n4:2013
n3:svazekPeriodika
549
n3:tvurceVysledku
Adámek, Petr Hubička, Zdeněk Straňák, V. Olejníček, Jiří Hippler, R. Čada, Martin Kment, Štěpán
n3:wos
000327537100033
s:issn
0040-6090
s:numberOfPages
7
n18:doi
10.1016/j.tsf.2013.06.061