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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F13%3A00397350%21RIV14-MSM-68378271
rdf:type
skos:Concept n13:Vysledek
dcterms:description
It is known that UV-C radiation kills fungus by radiating their DNA. We wanted to verify, if we could use radiation produced by excimer laser as an alternative method for the treatment of onychomycosis – nail fungus. Medical procedure like this should meet certain conditions such as perfectly and reliably destroying the fungi and to make no harm to the patient (in this case overheating of the under-nail tissue). The main part of the first stage of this work was to determine the coefficients for transmission, reflection and absorption of nails to determine the quantity of energy going through and absorbed by the nail – that means quantity of energy which could harm the healthy tissue. In the following stage we focused on the irradiation of the fungi. It is known that UV-C radiation kills fungus by radiating their DNA. We wanted to verify, if we could use radiation produced by excimer laser as an alternative method for the treatment of onychomycosis – nail fungus. Medical procedure like this should meet certain conditions such as perfectly and reliably destroying the fungi and to make no harm to the patient (in this case overheating of the under-nail tissue). The main part of the first stage of this work was to determine the coefficients for transmission, reflection and absorption of nails to determine the quantity of energy going through and absorbed by the nail – that means quantity of energy which could harm the healthy tissue. In the following stage we focused on the irradiation of the fungi.
dcterms:title
Treatment of onychomycosis using radiation of excimer laser Treatment of onychomycosis using radiation of excimer laser
skos:prefLabel
Treatment of onychomycosis using radiation of excimer laser Treatment of onychomycosis using radiation of excimer laser
skos:notation
RIV/68378271:_____/13:00397350!RIV14-MSM-68378271
n13:predkladatel
n14:ico%3A68378271
n3:aktivita
n4:P n4:I
n3:aktivity
I, P(LD12069)
n3:cisloPeriodika
JAN
n3:dodaniDat
n8:2014
n3:domaciTvurceVysledku
n12:4619048 n12:7895712
n3:druhVysledku
n17:J
n3:duvernostUdaju
n16:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
111743
n3:idVysledku
RIV/68378271:_____/13:00397350
n3:jazykVysledku
n6:eng
n3:klicovaSlova
excimer laser; UV-C radiation; nails; onychomycosis
n3:klicoveSlovo
n15:onychomycosis n15:excimer%20laser n15:nails n15:UV-C%20radiation
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[57D57BF274E6]
n3:nazevZdroje
Advanced Materials Research
n3:obor
n19:BM
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
4
n3:projekt
n11:LD12069
n3:rokUplatneniVysledku
n8:2013
n3:svazekPeriodika
647
n3:tvurceVysledku
Kymplová, J. Urzová, J. Jelínek, Miroslav Mikšovský, Jan
s:issn
1022-6680
s:numberOfPages
6
n9:doi
10.4028/www.scientific.net/AMR.647.636