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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F13%3A00395140%21RIV14-MSM-68378271
rdf:type
skos:Concept n16:Vysledek
dcterms:description
In situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) free-electron laser source using ablation technique. Design of the instrument reported here allows reaching a few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensures high-contrast visibility of ablative imprints on optically transparent samples, e.g., PMMA. This enables on-line monitoring of the beam profile changes and thus makes possible in situ alignment of the XUV focusing optics. A good agreement between focal characterizations retrieved from in situ inspection of ablative imprints contours and from well-established accurate ex situ analysis with Nomarski microscope has been observed for a typical micro-focus experiment. In situ focus characterization is demonstrated by working at an extreme ultraviolet (XUV) free-electron laser source using ablation technique. Design of the instrument reported here allows reaching a few micrometres resolution along with keeping the ultrahigh vacuum conditions and ensures high-contrast visibility of ablative imprints on optically transparent samples, e.g., PMMA. This enables on-line monitoring of the beam profile changes and thus makes possible in situ alignment of the XUV focusing optics. A good agreement between focal characterizations retrieved from in situ inspection of ablative imprints contours and from well-established accurate ex situ analysis with Nomarski microscope has been observed for a typical micro-focus experiment.
dcterms:title
In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source
skos:prefLabel
In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source In situ focus characterization by ablation technique to enable optics alignment at an XUV FEL source
skos:notation
RIV/68378271:_____/13:00395140!RIV14-MSM-68378271
n16:predkladatel
n17:ico%3A68378271
n3:aktivita
n19:I n19:P
n3:aktivity
I, P(ED1.1.00/02.0061), P(EE.2.3.20.0087), P(EE2.3.30.0057), P(GA13-28721S), P(GAP108/11/1312), P(GAP205/11/0571), P(GAP208/10/2302), P(LG13029)
n3:cisloPeriodika
6
n3:dodaniDat
n7:2014
n3:domaciTvurceVysledku
n11:8434050 n11:6173047 n11:3274713 n11:2712679
n3:druhVysledku
n4:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
79385
n3:idVysledku
RIV/68378271:_____/13:00395140
n3:jazykVysledku
n9:eng
n3:klicovaSlova
free electron lasers; laser ablation; laser beams; optical focusing; ultraviolet sources
n3:klicoveSlovo
n5:optical%20focusing n5:free%20electron%20lasers n5:ultraviolet%20sources n5:laser%20beams n5:laser%20ablation
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[6280D6363353]
n3:nazevZdroje
Review of Scientific Instruments
n3:obor
n18:BH
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
7
n3:projekt
n12:GAP208%2F10%2F2302 n12:GA13-28721S n12:ED1.1.00%2F02.0061 n12:EE.2.3.20.0087 n12:GAP205%2F11%2F0571 n12:LG13029 n12:EE2.3.30.0057 n12:GAP108%2F11%2F1312
n3:rokUplatneniVysledku
n7:2013
n3:svazekPeriodika
84
n3:tvurceVysledku
Juha, Libor Weigelt, H. Vyšín, Luděk Chalupský, Jaromír Dziarzhytski, S. Gerasimova, N. Hájková, Věra
n3:wos
000321273500050
s:issn
0034-6748
s:numberOfPages
6
n13:doi
10.1063/1.4807896