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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F12%3A00389192%21RIV13-GA0-68378271
rdf:type
skos:Concept n15:Vysledek
dcterms:description
The process parametric window for diamond deposition using the chemical vapor deposition at low pressures is quite limited where addition of oxygen in the gas phase broadens this window. The lower boundary of the lens-shaped domain in C-H-O ternary diagram concurs with the H2-CO tie-line (C/(C+O)=0.5). In this work, we present the set of experiments where the ratio of C/(C+O) was kept at a constant value 0.385. The effect of hydrogen concentration (ratio O/(O+H) varied from 0.047 to 0.364) on plasma characteristics and deposited NCD films were investigated. Raman spectroscopy confirmed the diamond character of all deposited coatings while scanning electron microscopy showed transformation from not closed to continuous film and further decrease of grain size and finally growth of diamond nanowires while decreasing hydrogen concentration in a gas mixture. The process parametric window for diamond deposition using the chemical vapor deposition at low pressures is quite limited where addition of oxygen in the gas phase broadens this window. The lower boundary of the lens-shaped domain in C-H-O ternary diagram concurs with the H2-CO tie-line (C/(C+O)=0.5). In this work, we present the set of experiments where the ratio of C/(C+O) was kept at a constant value 0.385. The effect of hydrogen concentration (ratio O/(O+H) varied from 0.047 to 0.364) on plasma characteristics and deposited NCD films were investigated. Raman spectroscopy confirmed the diamond character of all deposited coatings while scanning electron microscopy showed transformation from not closed to continuous film and further decrease of grain size and finally growth of diamond nanowires while decreasing hydrogen concentration in a gas mixture.
dcterms:title
Linear antenna microwave plasma CVD diamond deposition at the edge of no-growth region of C-H-O ternary diagram Linear antenna microwave plasma CVD diamond deposition at the edge of no-growth region of C-H-O ternary diagram
skos:prefLabel
Linear antenna microwave plasma CVD diamond deposition at the edge of no-growth region of C-H-O ternary diagram Linear antenna microwave plasma CVD diamond deposition at the edge of no-growth region of C-H-O ternary diagram
skos:notation
RIV/68378271:_____/12:00389192!RIV13-GA0-68378271
n15:predkladatel
n16:ico%3A68378271
n3:aktivita
n11:P n11:Z
n3:aktivity
P(GAP205/12/0908), P(GBP108/12/G108), Z(AV0Z10100521)
n3:cisloPeriodika
12
n3:dodaniDat
n12:2013
n3:domaciTvurceVysledku
n7:5635853 n7:6812872 n7:7465416 Babchenko, Oleg
n3:druhVysledku
n5:J
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
147114
n3:idVysledku
RIV/68378271:_____/12:00389192
n3:jazykVysledku
n20:eng
n3:klicovaSlova
C-H-O phase diagram; nanocrystalline diamond; plasma enhanced CVD; Raman spectroscopy; SEM
n3:klicoveSlovo
n6:Raman%20spectroscopy n6:C-H-O%20phase%20diagram n6:nanocrystalline%20diamond n6:SEM n6:plasma%20enhanced%20CVD
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[903405132D2A]
n3:nazevZdroje
Physica Status Solidi B-Basic Solid State Physics
n3:obor
n4:BM
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n9:GBP108%2F12%2FG108 n9:GAP205%2F12%2F0908
n3:rokUplatneniVysledku
n12:2012
n3:svazekPeriodika
249
n3:tvurceVysledku
Potocký, Štěpán Babchenko, Oleg Hruška, Karel Kromka, Alexander
n3:wos
000312215300074
n3:zamer
n19:AV0Z10100521
s:issn
0370-1972
s:numberOfPages
4
n17:doi
10.1002/pssb.201200124