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Statements

Subject Item
n2:RIV%2F68378271%3A_____%2F12%3A00388240%21RIV13-GA0-68378271
rdf:type
skos:Concept n6:Vysledek
dcterms:description
We investigate influence of pulse frequency on the temperature dependence of island densities in pulsed laser deposition on bcc(110) surface using two regimes of pulse frequency variation: one with constant average flux and the other with constant pulse intensity. We found that the effects on studied features in the two regimes are opposite. An increase in the pulse length for a given pulse frequency causes a decrease in the island density; the curve shift towards molecular beam epitaxy results. The increase of the diffusion barrier for non-interacting monomers shifts the whole Arrhenius curve to higher temperatures. We investigate influence of pulse frequency on the temperature dependence of island densities in pulsed laser deposition on bcc(110) surface using two regimes of pulse frequency variation: one with constant average flux and the other with constant pulse intensity. We found that the effects on studied features in the two regimes are opposite. An increase in the pulse length for a given pulse frequency causes a decrease in the island density; the curve shift towards molecular beam epitaxy results. The increase of the diffusion barrier for non-interacting monomers shifts the whole Arrhenius curve to higher temperatures.
dcterms:title
Influence of control and material parameters on island density in early stage of pulsed laser deposition Influence of control and material parameters on island density in early stage of pulsed laser deposition
skos:prefLabel
Influence of control and material parameters on island density in early stage of pulsed laser deposition Influence of control and material parameters on island density in early stage of pulsed laser deposition
skos:notation
RIV/68378271:_____/12:00388240!RIV13-GA0-68378271
n6:predkladatel
n7:ico%3A68378271
n3:aktivita
n11:Z n11:P
n3:aktivity
P(GA202/09/0775), Z(AV0Z10100520)
n3:cisloPeriodika
15
n3:dodaniDat
n15:2013
n3:domaciTvurceVysledku
n13:3260097 n13:8716935
n3:druhVysledku
n17:J
n3:duvernostUdaju
n10:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
141370
n3:idVysledku
RIV/68378271:_____/12:00388240
n3:jazykVysledku
n18:eng
n3:klicovaSlova
Monte Carlo simulations; pulsed laser deposition; surface diffusion; epitaxy; growth; nucleation
n3:klicoveSlovo
n4:Monte%20Carlo%20simulations n4:nucleation n4:surface%20diffusion n4:epitaxy n4:growth n4:pulsed%20laser%20deposition
n3:kodStatuVydavatele
CH - Švýcarská konfederace
n3:kontrolniKodProRIV
[0030BCC8FFD1]
n3:nazevZdroje
Thin Solid Films
n3:obor
n5:BE
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:projekt
n20:GA202%2F09%2F0775
n3:rokUplatneniVysledku
n15:2012
n3:svazekPeriodika
520
n3:tvurceVysledku
Kotrla, Miroslav Mašín, Martin
n3:wos
000304568300025
n3:zamer
n19:AV0Z10100520
s:issn
0040-6090
s:numberOfPages
6
n9:doi
10.1016/j.tsf.2012.03.021